Imaging device and electronic device

ABSTRACT

Provided are an imaging device and an electronic device configured such that deterioration in imaging performance due to high-angle incident light can be inhibited. The imaging device includes: a semiconductor substrate including a plurality of photoelectric conversion elements; a plurality of color filters that are provided on the semiconductor substrate and face each of the plurality of photoelectric conversion elements; and a partition wall that is provided on the semiconductor substrate and provides separation between one color filter and another color filter adjacent to each other among the plurality of color filters. The partition wall includes a first metal layer, a translucent first partition wall layer that covers a side surface of the first metal layer, and a translucent second partition wall layer located between the first metal layer and the first partition wall layer. A refractive index of the second partition wall layer is larger than a refractive index of the first partition wall layer.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuous application of U.S. patent applicationSer. No. 17/756,175, filed on May 18, 2022, which is a U.S. NationalPhase of International Patent Application No. PCT/JP2020/038146 filed onOct. 8, 2020, which claims priority benefit of Japanese PatentApplication No. JP 2019-215174 filed in the Japan Patent Office on Nov.28, 2019. Each of the above-referenced applications is herebyincorporated herein by reference in its entirety.

TECHNICAL FIELD

The present disclosure relates to an imaging device and an electronicdevice.

BACKGROUND ART

An imaging device used for a digital camera or the like has a pluralityof pixels. Each of the plurality of pixels is provided with aphotoelectric conversion element that detects light and generateselectrical charges. In addition, color filters that allow only light ofspecific colors to pass therethrough are provided above the plurality ofphotoelectric conversion elements. In this type of imaging device, atechnique of disposing a partition wall between a color filter of onepixel and a color filter of another pixel in order to prevent colormixing from occurring between adjacent pixels is known (see, forexample, PTL 1).

CITATION LIST Patent Literature

[PTL 1]

-   JP 2011-71483 A

SUMMARY Technical Problem

In the imaging device, when light is obliquely incident on a surface ofa color filter, some of the obliquely incident light may be reflected bya partition wall, and the reflected light that should not be incidentmay be photoelectrically converted in a pixel. For example, when lightsuch as flare light is incident on a surface of a color filter at a highangle, some of the light incident at a high angle (hereinafter referredto as high-angle incident light) passes through the color filter,reaches a partition wall, is reflected by the partition wall, and isincident on a pixel. As a result, the high-angle incident light isphotoelectrically converted, and color mixing or the like is caused in apixel signal, which may deteriorate performance of the imaging device.

The present disclosure has been made in view of such circumstances, andan object of the present invention is to provide an imaging device andan electronic device configured such that deterioration in imagingperformance due to high-angle incident light can be inhibited.

Solution to Problem

An imaging device according to one aspect of the present disclosureincludes: a semiconductor substrate including a plurality ofphotoelectric conversion elements; a plurality of color filters that areprovided on the semiconductor substrate and face each of the pluralityof photoelectric conversion elements; and a partition wall that isprovided on the semiconductor substrate and provides separation betweenone color filter and another color filter adjacent to each other amongthe plurality of color filters. The partition wall includes a firstmetal layer, a translucent first partition wall layer that covers a sidesurface of the first metal layer, and a translucent second partitionwall layer located between the first metal layer and the first partitionwall layer. A refractive index of the second partition wall layer islarger than a refractive index of the first partition wall layer.

According to this, the high-angle incident light that is incident on thesurface of the color filter at a high angle, such as flare light, passesthrough the color filter, the first partition wall layer, and the secondpartition wall layer, and reaches a side surface of the first metallayer. Since the refractive index of the second partition wall layer islarger than the refractive index of the first partition wall layer, thehigh-angle incident light that has reached the side surface of the firstmetal layer is attenuated while being repeatedly reflected between theside surface of the first metal layer and the first partition walllayer. Thus, the imaging device can reduce the high-angle incident lightthat reaches the photoelectric conversion element. The imaging devicecan inhibit deterioration in imaging performance due to the problem thatthe high-angle incident light is photoelectrically converted and causescolor mixing or the like in a pixel signal.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a schematic diagram showing a configuration example of animaging device according to a first embodiment of the presentdisclosure.

FIG. 2 is a cross-sectional view showing a configuration example of apartition wall and a peripheral portion thereof in the imaging deviceaccording to the first embodiment of the present disclosure.

FIG. 3 is a cross-sectional view showing an example of light guidingperformed by the partition wall of the imaging device according to thefirst embodiment of the present disclosure.

FIG. 4A is a cross-sectional view showing a method for manufacturing theimaging device according to the first embodiment of the presentdisclosure in the order of processes.

FIG. 4B is a cross-sectional view showing the method for manufacturingthe imaging device according to the first embodiment of the presentdisclosure in the order of processes.

FIG. 4C is a cross-sectional view showing the method for manufacturingthe imaging device according to the first embodiment of the presentdisclosure in the order of processes.

FIG. 4D is a cross-sectional view showing the method for manufacturingof the imaging device according to the first embodiment of the presentdisclosure in the order of processes.

FIG. 4E is a cross-sectional view showing the method for manufacturingof the imaging device according to the first embodiment of the presentdisclosure in the order of processes.

FIG. 4F is a cross-sectional view showing the method for manufacturingof the imaging device according to the first embodiment of the presentdisclosure in the order of processes.

FIG. 4G is a cross-sectional view showing the method for manufacturingof the imaging device according to the first embodiment of the presentdisclosure in the order of processes.

FIG. 4H is a cross-sectional view showing the method for manufacturingof the imaging device according to the first embodiment of the presentdisclosure in the order of processes.

FIG. 4I is a cross-sectional view showing the method for manufacturingof the imaging device according to the first embodiment of the presentdisclosure in the order of processes.

FIG. 4J is a cross-sectional view showing the method for manufacturingthe imaging device according to the first embodiment of the presentdisclosure in the order of

FIG. 4K is a cross-sectional view showing the method for manufacturingthe imaging device according to the first embodiment of the presentdisclosure in the order of processes.

FIG. 5 is a graph showing results of evaluating a relationship betweenan incidence angle on a surface of a color filter, quantum efficiency,and a sensitivity ratio in the imaging device according to the firstembodiment of the present disclosure and an imaging device according toa comparative example.

FIG. 6 is a cross-sectional view showing a configuration of a partitionwall and a peripheral portion thereof in an imaging device according toa second embodiment of the present disclosure.

FIG. 7A is a cross-sectional view showing a method for manufacturing theimaging device according to the second embodiment of the presentdisclosure in the order of processes.

FIG. 7B is a cross-sectional view showing the method for manufacturingthe imaging device according to the second embodiment of the presentdisclosure in the order of processes.

FIG. 8 is a cross-sectional view showing a configuration example of thepartition wall and the peripheral portion thereof in the imaging deviceaccording to the second embodiment of the present disclosure.

FIG. 9 is a cross-sectional view for explaining prevention of lightreflection from a semiconductor substrate side toward a color filterside in the imaging device according to the second embodiment of thepresent disclosure.

FIG. 10A is a cross-sectional view showing a method for manufacturingthe imaging device according to a third embodiment of the presentdisclosure in the order of processes.

FIG. 10B is a cross-sectional view showing the method for manufacturingthe imaging device according to the third embodiment of the presentdisclosure in the order of processes.

FIG. 10C is a cross-sectional view showing the method for manufacturingthe imaging device according to the third embodiment of the presentdisclosure in the order of processes.

FIG. 10D is a cross-sectional view showing the method for manufacturingthe imaging device according to the third embodiment of the presentdisclosure in the order of processes.

FIG. 10E is a cross-sectional view showing the method for manufacturingthe imaging device according to the third embodiment of the presentdisclosure in the order of processes.

FIG. 11 is a cross-sectional view showing a configuration example of apartition wall and a peripheral portion thereof in an imaging deviceaccording to a fourth embodiment of the present disclosure.

FIG. 12 is a cross-sectional view for explaining light shielding from apartition wall side to a semiconductor substrate side in the imagingdevice according to the fourth embodiment of the present disclosure.

FIG. 13A is a cross-sectional view showing a method for manufacturingthe imaging device according to the fourth embodiment of the presentdisclosure in the order of processes.

FIG. 13B is a cross-sectional view showing the method for manufacturingthe imaging device according to the fourth embodiment of the presentdisclosure in the order of processes.

FIG. 13C is a cross-sectional view showing the method for manufacturingthe imaging device according to the fourth embodiment of the presentdisclosure in the order of processes.

FIG. 13D is a cross-sectional view showing the method for manufacturingthe imaging device according to the fourth embodiment of the presentdisclosure in the order of processes.

FIG. 13E is a cross-sectional view showing the method for manufacturingthe imaging device according to the fourth embodiment of the presentdisclosure in the order of processes.

FIG. 13F is a cross-sectional view showing the method for manufacturingthe imaging device according to the fourth embodiment of the presentdisclosure in the order of processes.

FIG. 13G is a cross-sectional view showing the method for manufacturingthe imaging device according to the fourth embodiment of the presentdisclosure in the order of processes.

FIG. 13H is a cross-sectional view showing the method for manufacturingthe imaging device according to the fourth embodiment of the presentdisclosure in the order of processes.

FIG. 14 is a cross-sectional view showing a configuration example of apartition wall and a peripheral portion thereof in an imaging deviceaccording to a fifth embodiment of the present disclosure.

FIG. 15A is a cross-sectional view showing a method for manufacturingthe imaging device according to the fifth embodiment of the presentdisclosure in the order of processes.

FIG. 15B is a cross-sectional view showing the method for manufacturingthe imaging device according to the fifth embodiment of the presentdisclosure in the order of processes.

FIG. 16 is a cross-sectional view showing a configuration example of apartition wall and a peripheral portion thereof in an imaging deviceaccording to a sixth embodiment of the present disclosure.

FIG. 17 is a diagram illustrating a central region and a peripheralregion of an imaging region configured of a plurality of photodiodes inan imaging device according to a seventh embodiment of the presentdisclosure.

FIG. 18 shows the imaging device according to the seventh embodiment ofthe present disclosure and is a cross-sectional view showing aconfiguration example of a partition wall and a peripheral portionthereof in a peripheral region of an imaging region.

FIG. 19 is a cross-sectional view showing a configuration example of apartition wall and a peripheral portion thereof in an imaging deviceaccording to an eighth embodiment of the present disclosure.

FIG. 20A is a cross-sectional view showing a method for manufacturingthe imaging device according to the eighth embodiment of the presentdisclosure in the order of processes.

FIG. 20B is a cross-sectional view showing the method for manufacturingthe imaging device according to the eighth embodiment of the presentdisclosure in the order of processes.

FIG. 20C is a cross-sectional view showing the method for manufacturingthe imaging device according to the eighth embodiment of the presentdisclosure in the order of processes.

FIG. 20D is a cross-sectional view showing the method for manufacturingthe imaging device according to the eighth embodiment of the presentdisclosure in the order of processes.

FIG. 20E is a cross-sectional view showing the method for manufacturingthe imaging device according to the eighth embodiment of the presentdisclosure in the order of processes.

FIG. 20F is a cross-sectional view showing the method for manufacturingthe imaging device according to the eighth embodiment of the presentdisclosure in the order of processes.

FIG. 20G is a cross-sectional view showing the method for manufacturingthe imaging device according to the eighth embodiment of the presentdisclosure in the order of processes.

FIG. 21 is a cross-sectional view showing a configuration example of apartition wall and a peripheral portion thereof in an imaging deviceaccording to a ninth embodiment of the present disclosure.

FIG. 22A is a cross-sectional view showing a method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 22B is a cross-sectional view showing the method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 22C is a cross-sectional view showing the method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 22D is a cross-sectional view showing the method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 22E is a cross-sectional view showing the method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 22F is a cross-sectional view showing the method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 22G is a cross-sectional view showing the method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 22H is a cross-sectional view showing the method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 22I is a cross-sectional view showing the method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 22J is a cross-sectional view showing the method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 22K is a cross-sectional view showing the method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 22L is a cross-sectional view showing the method for manufacturingthe imaging device according to the ninth embodiment of the presentdisclosure in the order of processes.

FIG. 23 is a conceptual diagram showing an example in which thetechnique according to the present disclosure (the present technique) isapplied to an electronic device.

FIG. 24 is a diagram showing an example of a schematic configuration ofan endoscopic surgery system to which the technique according to thepresent disclosure (the present technique) may be applied.

FIG. 25 is a block diagram showing an example of a functionalconfiguration of a camera head and a CCU shown in FIG. 24 .

FIG. 26 is a block diagram showing a schematic configuration example ofa mobile object control system that is an example of a vehicle controlsystem to which the technique according to the present disclosure may beapplied.

FIG. 27 is a diagram showing an example of an installation position ofan imaging unit.

DESCRIPTION OF EMBODIMENTS

Embodiments of the present disclosure will be described below withreference to the figures. In descriptions of the figures referring to inthe following description, the same or similar portions will be denotedby the same or similar reference signs. However, it should be noted thatthe figures are schematic and relationships between thicknesses andplanar dimensions, ratios of thicknesses of respective layers, and thelike are different from actual ones. Accordingly, specific thicknessesand dimensions should be determined by taking the following descriptioninto consideration. In addition, it goes without saying that the figuresalso include portions having different dimensional relationships andratios from each other.

In addition, it is to be understood that definitions of directions suchas upward and downward in the following description are merelydefinitions provided for the sake of brevity and are not intended tolimit technical ideas of the present disclosure. For example, it isobvious that when an object is observed after being rotated by 90°,upward and downward are converted into and interpreted as leftward andrightward, and when an object is observed after being rotated by 180°,upward and downward are interpreted as being inverted.

First Embodiment (Overall Structure)

FIG. 1 is a diagram showing a configuration example of an imaging device100 according to a first embodiment of the present disclosure. Theimaging device 100 shown in FIG. 1 is, for example, a CMOS solid-stateimaging device. As shown in FIG. 1 , the imaging device 100 isconfigured to have a pixel region (a so-called imaging region) 3, inwhich pixels 102 including a plurality of photoelectric conversionelements are regularly arranged two-dimensionally, and a peripheralcircuit portion on a semiconductor substrate 111 (for example, a siliconsubstrate). The pixel 102 is configured to have a photodiode serving asa photoelectric conversion element, and a plurality of pixel transistors(so-called MOS transistors). The plurality of pixel transistors can beconfigured of three transistors, including a transfer transistor, areset transistor, and an amplification transistor. The plurality ofpixel transistors can also be configured of four transistors by adding aselection transistor to the above three transistors. Since an equivalentcircuit of a unit pixel is the same as usual, detailed descriptionthereof will be omitted. The pixel 102 may also have a shared pixelstructure. The shared pixel structure is configured of a plurality ofphotodiodes, a plurality of transfer transistors, one shared floatingdiffusion, and one other shared pixel transistor.

The peripheral circuit portion includes a vertical drive circuit 104,column signal processing circuits 105, a horizontal drive circuit 106,an output circuit 107, a control circuit 108, and the like.

The control circuit 108 receives input clocks and data instructing anoperation mode and the like and outputs data such as internalinformation of the solid-state imaging device. That is, the controlcircuit 108 generates clock signals and control signals serving asreferences for operations of the vertical drive circuit 104, the columnsignal processing circuits 105, the horizontal drive circuit 106, andthe like on the basis of vertical sync signals, horizontal sync signalsand master clocks. In addition, the control circuit 108 inputs thesesignals to the vertical drive circuit 104, the column signal processingcircuits 105, the horizontal drive circuit 106, and the like.

The vertical drive circuit 104 is configured of, for example, a shiftregister, selects a pixel drive wiring, supplies pulses for drivingpixels to the selected pixel drive wiring, and drives the pixels foreach row. That is, the vertical drive circuit 104 sequentially selectsand scans the pixels 102 in the pixel region 103 in the verticaldirection for each row and supplies pixel signals based on signalcharges generated in accordance with an amount of light received in thephotoelectric conversion element of each of the pixels 102 to the columnsignal processing circuits 105 through vertical signal lines 109.

The column signal processing circuits 105 are disposed, for example, foreach column of the pixels 102 and perform signal processing such asnoise reduction of signals output from the pixels 102 in one row foreach pixel row. That is, the column signal processing circuits 105perform signal processing such as CDS for removing fixed pattern noiseunique to the pixels 102, signal amplification, and AD conversion.Horizontal selection switches (not shown) are provided at output stagesof the column signal processing circuits 105 to be connected between theoutput stages and the horizontal signal line 110.

The horizontal drive circuit 106 is configured of, for example, a shiftregister, sequentially selects each of the column signal processingcircuits 105 by sequentially outputting horizontal scan pulses, andoutputs pixel signals from each of the column signal processing circuits105 to the horizontal signal line 110.

The output circuit 107 performs signal processing on signalssequentially supplied from each of the column signal processing circuits105 through the horizontal signal line 110 and outputs the signals. Forexample, the output circuit 107 may only perform buffering, or mayperform black level adjustment, column variation correction, variousdigital signal processing, and the like. Input and output terminals 112exchange signals with the outside.

(Structures of Partition Wall and Peripheral Portion Thereof)

FIG. 2 is a cross-sectional view showing a configuration example of apartition wall 2 and a peripheral portion thereof in the imaging device100 according to the first embodiment of the present disclosure. Theimaging device 100 has, for example, a back surface light receiving typepixel structure in which incident light is caused to enter from a backsurface side of a semiconductor substrate 111. As shown in FIG. 2 , aplurality of photodiode PDs are provided on a back surface (hereinafter,a light receiving surface) 111 a side of the semiconductor substrate111. Further, a translucent insulating film 11 is provided on the lightreceiving surface 111 a of the semiconductor substrate 111. Theinsulating film 11 is, for example, a silicon oxide film (SiO₂).

The semiconductor substrate 111 is a silicon layer formed by polishing asilicon wafer by chemical mechanical polishing (CMP). A thickness of thesemiconductor substrate 111 may be arbitrarily set in accordance with awavelength of received light. As an example, the thickness of thesemiconductor substrate 111 is 5 μm or more and 15 μm or less whenvisible light is received, 15 μm or more and 50 μm or less when infraredlight is received, and 3 μm or more and 7 μm or less when ultravioletlight is received.

A plurality of color filter CFs are provided on the light receivingsurface 111 a of the semiconductor substrate 111 via the insulating film11. The plurality of color filter CFs include, for example, colorfilters CF1 to CF3. The color filters CF1 to CF3 are colored blue (B),green (G), or red (R), respectively. The color filters CF1 to CF3 aredisposed at positions at which they respectively face photodiodes PD1 toPD3 via the insulating film 11.

Although not shown, the plurality of color filter CFs include a colorfilter CF4 disposed at a position adjacent to at least one or more ofthe color filters CF1 to CF3. The color filter CF4 may be colored in anyone of blue (B), green (G), and red(R), or may be colored in anothercolor other than these. The color filter CF4 is disposed at a positionat which it faces a photodiode PD4 via the insulating film 11. In thefollowing, in a case in which it is not necessary to distinguish thecolor filters CF1 and CF4 from each other, an identification number atthe end of the CF serving as a reference sign will be omitted.

Also, partition walls 2 are provided on the light receiving surface 111a of the semiconductor substrate 111 via the insulating film 11. Aplurality of color filter CFs are separated from each other by thepartition walls 2. Further, a plurality of micro lenses ML (an exampleof the “lens” of the present disclosure) are provided on a side oppositeto the semiconductor substrate 111 with the plurality of color filterCFs interposed therebetween. One micro lens ML is disposed on one colorfilter CF. End portions MLEs of the plurality of micro lenses ML areconnected to each other. The end portions MLE of the micro lenses ML aredisposed on the partition walls 2.

The partition wall 2 has a first metal layer 20 located at a centralportion of the partition wall 2, a first translucent partition walllayer 21 that covers the first metal layer 20 from an outer sidethereof, and a second translucent partition wall layer 22 locatedbetween the first metal layer 20 and the first partition wall layer 21.For example, the first metal layer 20 has a first side surface 20 a anda second side surface 20 b that face the color filters CF in ahorizontal direction parallel to the light receiving surface 111 a ofthe semiconductor substrate 111, and an upper end surface 20 c (anexample of the “end surface” of the present disclosure) that faces theend portion of the micro lens ML in a direction orthogonal to thehorizontal direction. The second side surface 20 b is located on a sideopposite to the first side surface 20 a. The upper end surface 20 c islocated on the micro lens side.

The second partition wall layer 22 covers the first side surface 20 a,the second side surface 20 b, and the upper end surface 20 c of thefirst metal layer 20. The first partition wall layer 21 covers the firstside surface 20 a, the second side surface 20 b, and the upper endsurface 20 c of the first metal layer 20 via the second partition walllayer 22.

The first metal layer 20 is made of, for example, copper (Cu) ortungsten (W). The first partition wall layer 21 and the second partitionwall layer 22 are each configured of a translucent film through whichlight (for example, at least one type of light of visible light,infrared light, and ultraviolet light) received by the pixels 102 canpass. For example, the first partition wall layer 21 is made of asilicon oxide film (SiO₂). The second partition wall layer 22 is made ofa silicon carbide film (a-SiC) having an amorphous crystal structure.

In the present embodiment, a refractive index n22 of the secondpartition wall layer 22 is larger than a refractive index n21 of thefirst partition wall layer 21 (n22>n21). Also, a refractive index ncf ofthe color filter CF is larger than the refractive index n21 of the firstpartition wall layer 21 (ncf>n21). For example, a refractive index ofa-SiC used for the second partition wall layer 22 is 2.6. A refractiveindex of SiO₂ used for the first partition wall layer 21 is 1.46. Arefractive index of the color filter CF is 1.68.

(Example of Light Guidance Performed by Partition Wall)

FIG. 3 is a cross-sectional view showing an example of light guidingperformed by the partition wall of the imaging device according to thefirst embodiment of the present disclosure. As shown in FIG. 3 , a casein which light L1 is obliquely incident on a surface of the color filterCF through the micro lens ML, and the incident light L1 reaches asurface of the first partition wall layer 21 of the partition wall 2 isassumed.

An incidence angle on the surface of the color filter CF is defined asθ1, and an incidence angle on the surface of the first partition walllayer 21 is defined as θ2. The incidence angles θ1 and θ2 have arelationship of, for example, θ1=90°−θ2.

As described above, the refractive index ncf of the color filter CF islarger than the refractive index n21 of the first partition wall layer21 (ncf>n21). For this reason, in a case in which the incidence angle θ1of the light L1 on the surface of the color filter CF is a low angle andthe incidence angle θ2 on the surface of the first partition wall layer21 is equal to or greater than a critical angle, the light L1 is totallyreflected on the surface of the first partition wall layer 21. Thecritical angle is the smallest incidence angle at which total reflectionoccurs when light travels from a medium with a high refractive index toa medium with a low refractive index. The light L2 totally reflected bythe first partition wall layer 21 travels toward the light receivingsurface 111 a side of the semiconductor substrate 111 provided with thephotodiode PD.

On the other hand, in a case in which the incidence angle θ1 of thelight L1 on the surface of the color filter CF is a high angle (that is,the light L1 is a high-angle incident light) and the incidence angle θ2on the surface of the first partition wall layer 21 is less than thecritical angle, the light L1 is incident on the first partition walllayer 21 except for a part thereof. Light L3 incident on the firstpartition wall layer 21 passes through the first partition wall layer 21and the second partition wall layer 22 except for a part thereof,reaches a side surface of the first metal layer 20 (for example, thefirst side surface 20 a), and is reflected on the side surface of thefirst metal layer 20. The light L3 reflected on the side surface of thefirst metal layer 20 passes through the second partition wall layer 22and reaches the first partition wall layer 21.

As described above, the refractive index n22 of the second partitionwall layer 22 is larger than the refractive index n21 of the firstpartition wall layer 21 (n21<n22). In addition, the light L3 isobliquely incident on the first partition wall layer 21. For thisreason, the light L3 that has reached the first partition wall layer 21is reflected again to the second partition wall layer 22 side except fora part thereof. For example, in a case in which an incidence angle θ3 ofthe light L3 on the first partition wall layer 21 is equal to or greaterthan the critical angle, the light L3 is totally reflected by the firstpartition wall layer 21. The light L3 is repeatedly reflected betweenthe first metal layer 20 and the first partition wall layer 21 and isconfined in the second partition wall layer 22. Intensity of the lightL3 confined in the second partition wall layer 22 is attenuated eachtime the light L3 is reflected by the side surface of the first metallayer 20.

In this way, the light L3 is attenuated while repeating the reflectionbetween the first metal layer 20 and the first partition wall layer 21.Thus, the imaging device 100 can prevent the high-angle incident light(for example, flare light) from reaching the light receiving surface 111a of the semiconductor substrate 111. The imaging device 100 can reducethe flare light that reaches the photodiode PD.

Further, as shown in FIG. 3 , each of the light L1 and L2 reaches thephotodiode PD and is photoelectrically converted, but a part thereof isreflected by a surface of the insulating film 11 and the light receivingsurface 111 a before reaching the photodiode PD. At least a part of thereflected light L4 is incident on the partition wall 2 in the samemanner as the above-mentioned light L3 and is attenuated while repeatingthe reflection between the side surface of the first metal layer 20 (forexample, the second side surface 20 b) and the first partition walllayer 21. Thus, the imaging device 100 can inhibit the light L4reflected in one pixel 102 from leaking to another pixel 102 through thepartition wall 2.

Next, a method for manufacturing the imaging device 100 shown in FIG. 2will be described. The imaging device 100 is manufactured by usingvarious devices such as a film forming device (including a chemicalvapor deposition (CVD) device, a sputtering device, and a thermaloxidation device), an exposure device, an etching device, a chemicalmechanical polishing (CMP) device, and a bonding device. Hereinafter,these devices are collectively referred to as a manufacturing device.The partition wall 2 of the imaging device 100 and a peripheral portionthereof can be manufactured by a manufacturing method described below.

FIGS. 4A, 4B, 4C, 4D, 4E, 4F, 4G, 4H, 4I, 4J, and 4K are cross-sectionalviews showing a method for manufacturing the imaging device according tothe first embodiment of the present disclosure in the order ofprocesses. As shown in FIG. 4A, the manufacturing device forms theinsulating film 11 on the light receiving surface 111 a of thesemiconductor substrate 111 on which the photodiode PD has been formed.For example, the insulating film 11 is a silicon oxide film (SiO₂), anda forming method thereof is a thermal oxidation or CVD method of thesemiconductor substrate 111. Next, the manufacturing device forms ametal layer 20′ on the insulating film 11. For example, the metal layer20′ is a thin film of copper (Cu) or tungsten (W), and a forming methodthereof is a vapor deposition or sputtering method.

Next, as shown in FIG. 4B, the manufacturing device forms a resistpattern RP1 on the metal layer 20′. The resist pattern RP1 has a shapethat covers a region serving as the first metal layer 20 (see FIG. 2 )of the partition wall 2 and exposes other regions. Next, themanufacturing device dry-etches the metal layer 20′ using the resistpattern RP1 as a mask. Thus, as shown in FIG. 4C, the first metal layer20 is formed. Next, as shown in FIG. 4D, the manufacturing deviceremoves the resist pattern RP1.

Next, as shown in FIG. 4E, the manufacturing device forms a translucentinsulating layer 22′ above the light receiving surface 111 a. Forexample, the insulating layer 22′ is a silicon carbide film (a-SiC)having an amorphous crystal structure, and a forming method thereof is aCVD method. The insulating film 11 and the first side surface 20 a, thesecond side surface 20 b, and the upper end surface 20 c of the firstmetal layer 20 are covered with the insulating layer 22′.

Next, as shown in FIG. 4F, the manufacturing device forms a resistpattern RP2 on the insulating layer 22′. The resist pattern RP2 has ashape that covers the region serving as the first metal layer 20 and thesecond partition wall layer 22 (see FIG. 2 ) of the partition wall 2 andexposes other regions. Next, the manufacturing device dry-etches theinsulating layer 22′ using the resist pattern RP2 as a mask. Dry etchingis, for example, reactive ion etching (RIE). Thus, as shown in FIG. 4G,the second partition wall layer 22 is formed. After that, themanufacturing device removes the resist pattern RP2.

Next, as shown in FIG. 4H, the manufacturing device forms a translucentinsulating layer 21′ above the light receiving surface 111 a. Forexample, the insulating layer 21′ is a silicon oxide film (SiO₂), and aforming method thereof is a CVD method. The insulating film 11 and thesecond partition wall layer 22 are each covered with the insulatinglayer 21′.

Next, the manufacturing device forms a resist pattern (not shown) on theinsulating layer 21′. This resist pattern has a shape that covers theregion serving as the first partition wall layer 21 (see FIG. 2 ) of thepartition wall 2 and exposes other regions. Next, the manufacturingdevice dry-etches the insulating layer 21′ using the resist pattern as amask. Dry etching is, for example, RIE. Thus, as shown in FIG. 4I, thesecond partition wall layer 22 is formed. The partition wall 2 havingthe first metal layer 20, the first partition wall layer 21, and thesecond partition wall layer 22 is finally formed. After that, themanufacturing device removes the resist pattern RP2.

Next, as shown in FIG. 4J, the manufacturing device forms the colorfilters CFs in regions between adjacent partition walls 20 (that is,above the photodiode PD). The manufacturing device uses lithographytechnology to create the color filters CFs for each color. For example,the manufacturing device forms a blue (B) color filter CF1 above thephotodiode PD1. Next, the manufacturing device forms a green (G) colorfilter CF2 above the photodiode PD2. Next, the manufacturing deviceforms a red (R) color filter CF3 above the photodiode PD3. Each of thecolor filters CF1 to CF3 is formed such that its bottom surface is incontact with an upper surface of the insulating film 11, its sidesurface is in contact with the partition wall 2, and its upper surfaceis at the same height as the partition wall 2.

Next, as shown in FIG. 4K, the manufacturing device forms the micro lensML above each of the plurality of color filters CFs. The micro lens MLis a convex lens having a curved upper surface and is made of a filmthrough which light passes. The manufacturing device forms a resin filmon the color filters CFs, heats and melts the formed resin film, androunds a shape of an upper surface of the melted resin film, therebyforming the micro lenses MLs. The imaging device 100 shown in FIG. 2 isfinally formed through the above processes.

(Evaluation Results)

FIG. 5 is a graph showing results of evaluating a relationship betweenthe incidence angle θ1 on the surface of the color filter CF (see FIG. 3), quantum efficiency, and a sensitivity ratio in the imaging deviceaccording to the first embodiment of the present disclosure and animaging device according to a comparative example. The horizontal axisin FIG. 5 indicates the incidence angle θ1. The vertical axis on a leftside in FIG. 5 shows the quantum efficiency (QE) for green light. Inaddition, the vertical axis on a right side in FIG. 5 shows thesensitivity ratio for green light. The sensitivity ratio is representedby a ratio of quantum efficiency of the first embodiment to quantumefficiency of the comparative example. In addition, the first embodimentis different from the comparative example in a structure of thepartition wall. A partition wall of the comparative example has aconfiguration in which the second partition wall layer 22 is removedfrom the partition wall of the first embodiment.

As shown in FIG. 5 , in the range in which the incidence angle θ1 issmall, for example, θ1≤20°, there is no significant difference inquantum efficiency (QE) between the first embodiment and theconventional example. On the other hand, in the range in which theincidence angle θ1 is large, for example, θ1≥60°, the quantum efficiencyof the first embodiment is lower than the quantum efficiency of thecomparative example, and the sensitivity ratio is lowered. It wasconfirmed that the imaging device according to the first embodiment hasthe same sensitivity as the imaging device according to the comparativeexample for low-angle incident light and can be less sensitive tohigh-angle incident light than the imaging device according to thecomparative example.

As described above, the imaging device 100 according to one aspect ofthe present disclosure includes the semiconductor substrate 111 havingthe plurality of photodiodes PDs, the plurality of color filters CFsthat are provided on the semiconductor substrate 111 and respectivelyface the plurality of photodiodes PDs, and the partition wall 2 that isprovided on the semiconductor substrate 111 and provides separationbetween one color filter CF and another color filter CF adjacent to eachother among the plurality of color filters CFs. The partition wall 2 hasthe first metal layer 20, the first translucent partition wall layer 21that covers the side surface of the first metal layer 20, and the secondtranslucent partition wall layer 22 located between the first metallayer 20 and the first partition wall layer 21. The refractive index ofthe second partition wall layer 22 is larger than the refractive indexof the first partition wall layer 21.

According to this, high-angle incident light, such as flare light, thatis incident on the surface of the color filter CF at a high angle passesthrough the color filter CF, the first partition wall layer 21, and thesecond partition wall layer 22 and reaches the side surface of the firstmetal layer 20. Since the refractive index of the second partition walllayer 22 is larger than the refractive index of the first partition walllayer 21, the high-angle incident light that has reached the sidesurface of the first metal layer 20 is attenuated while being repeatedlyreflected between the side surface of the first metal layer 20 and thefirst partition wall layer 21. Thus, the imaging device 100 can reducethe high-angle incident light that reaches the photodiode PD. Theimaging device 100 can inhibit deterioration in imaging performance dueto the problem that the high-angle incident light is photoelectricallyconverted and causes color mixing or the like in a pixel signal.

Second Embodiment

In the first embodiment described above, the upper end surface 20 c ofthe first metal layer 20 is covered with the second partition wall layer22 and the first partition wall layer 21. However, in the embodiments ofthe present disclosure, the structure of the partition wall is notlimited thereto. At least one of the second partition wall layer 22 andthe first partition wall layer 21 may not be present on the upper endsurface 20 c of the first metal layer 20.

FIG. 6 is a cross-sectional view showing a configuration of a partitionwall 2 and a peripheral portion thereof in an imaging device 100Aaccording to a second embodiment of the present disclosure. As shown inFIG. 6 , in the partition wall 2 of the imaging device 100A, the upperend surface 20 c of the first metal layer 20 is exposed from the firstpartition wall layer 21 and the second partition wall layer 22. Inaddition, the upper end surface 20 c of the first metal layer 20 is incontact with the micro lens ML.

In the imaging device 100A, the high-angle incident light that hasreached the side surface of the first metal layer 20 is also attenuatedwhile being repeatedly reflected between the side surface of the firstmetal layer 20 and the first partition wall layer 21. Accordingly, theimaging device 100A can reduce the high-angle incident light thatreaches the photodiode PD. The imaging device 100A can inhibitdeterioration in imaging performance due to the problem that high-angleincident light is photoelectrically converted and causes color mixing orthe like in a pixel signal.

Next, a method for manufacturing the imaging device 100A shown in FIG. 6will be described. FIGS. 7A and 7B are cross-sectional views showing themethod for manufacturing the imaging device 100A according to the secondembodiment of the present disclosure in the order of processes. In FIG.7A, processes up to the process of forming the insulating layer 21′ arethe same as those in the method for manufacturing the imaging device 100described above. After the insulating layer 21′ is formed, as shown inFIG. 7B, the manufacturing device performs a CMP treatment to thesurface of the insulating layer 21′ to expose the upper end surface 20 cof the first metal layer 20. Through the CMP treatment, the upper endsurface 20 c of the first metal layer 20 becomes flush with orsubstantially flush with an upper surface of the insulating layer 21′.

The subsequent processes are the same as those in the method formanufacturing the imaging device 100 described in the first embodiment.The manufacturing device dry-etches the insulating layer 21′ using aresist pattern as a mask and forms the first partition wall layer 21(see FIG. 4I). Next, the manufacturing device forms the color filtersCFs (see FIG. 4J) and the micro lenses MLs (see FIG. 4K). Through theabove processes, the imaging device 100A shown in FIG. 6 is finallyformed.

Third Eembodiment

In the first embodiment, an aspect in which only the insulating film 11is disposed between the semiconductor substrate 111 and the colorfilters CFs has been shown. However, in the embodiments of the presentdisclosure, a structure between the semiconductor substrate 111 and thecolor filters CFs is not limited thereto. An antireflection film may bedisposed between the semiconductor substrate 111 and the color filtersCFs. Also, at least one of the first partition wall layer 21 and thesecond partition wall layer 22 may be used for the antireflection film.

FIG. 8 is a cross-sectional view showing a configuration example of apartition wall 2 and a peripheral portion thereof in an imaging device100B according to the second embodiment of the present disclosure. Asshown in FIG. 8 , in the imaging device 100B, the first partition walllayer 21 and the second partition wall layer 22 are provided between thesemiconductor substrate 111 and the color filters CFs. For example, theinsulating film 11, the second partition wall layer 22, the firstpartition wall layer 21, and the color filters CFs are laminated inorder above the photodiodes PDs. The second partition wall layer 22 andthe first partition wall layer 21 disposed between the semiconductorsubstrate 111 and the color filters CFs function as antireflection filmsfor preventing light from being reflected from the semiconductorsubstrate 111 side to the color filter CF side.

FIG. 9 is a cross-sectional view for explaining prevention of lightreflection from the semiconductor substrate 111 side to the color filterCF side in the imaging device 100B according to the second embodiment ofthe present disclosure. In FIG. 9 , a color filter (not shown) isdisposed on the first partition wall layer 21. A case in which light L11that has passed through the color filter is incident on a surface of thefirst partition wall layer 21 located above the photodiode PDsubstantially vertically is assumed.

The light L11 that has passed through the first partition wall layer 21passes through the second partition wall layer 22 having a higherrefractive index than the first partition wall layer 21 and theinsulating film 11 and reaches the back surface (light receivingsurface) 111 a of the semiconductor substrate 111. The light L11 thathas reached the light receiving surface 111 a is photoelectricallyconverted by the photodiode PD. In addition, a part of the light L11 isreflected by the surface of the insulating film 11 and the lightreceiving surface 111 a before reaching the photodiode PD. The reflectedlight L12 passes through the second partition wall layer 22 and reachesthe first partition wall layer 21. As described above, the refractiveindex n22 of the second partition wall layer 22 is larger than therefractive index n21 of the first partition wall layer 21 (n21<n22). Forthis reason, at least a part of the light L12 that has reached the firstpartition wall layer 21 is reflected again toward the second partitionwall layer 22 side. The reflected light L13 passes through the secondpartition wall layer 22 and the insulating film 11, reaches the backsurface (light receiving surface) 111 a of the semiconductor substrate111, and is photoelectrically converted by the photodiode PD.

In the imaging device 100B, the high-angle incident light that hasreached the side surface of the first metal layer 20 is also attenuatedwhile being repeatedly reflected between the side surface of the firstmetal layer 20 and the first partition wall layer 21. Accordingly, theimaging device 100B can reduce the high-angle incident light thatreaches the photodiode PD. The imaging device 100B can inhibitdeterioration in imaging performance due to the problem that thehigh-angle incident light is photoelectrically converted and causescolor mixing or the like in a pixel signal.

Further, the first partition wall layer 21 and the second partition walllayer 22 also function as antireflection films that prevent light frombeing reflected from the photodiode PD side to the color filter CF side.The first partition wall layer 21 and the second partition wall layer 22reflect the light reflected by the light receiving surface 111 a of thesemiconductor substrate 111 toward the light receiving surface 111 aagain. Thus, the imaging device 100B can increase the quantumefficiency.

Next, a method for manufacturing the imaging device 100B shown in FIG. 8will be described. FIGS. 10A, 10B, 10C, 10D, and 10E are cross-sectionalviews showing the method for manufacturing the imaging device 100Baccording to the third embodiment of the present disclosure in the orderof processes. In FIG. 10A, processes up to the process of forming thefirst metal layer 20 are the same as those in the method formanufacturing the imaging device 100 described in the first embodiment.

After the first metal layer 20 has been formed, as shown in FIG. 10B,the manufacturing device forms the second partition wall layer 22 abovethe semiconductor substrate 111. For example, the second partition walllayer 22 is a silicon carbide film (a-SiC) having an amorphous crystalstructure, and a forming method thereof is a CVD method. Themanufacturing device forms the second partition wall layer 22 to bethinner than the insulating layer 22′ (see FIG. 4E).

Next, as shown in FIG. 10C, the manufacturing device forms the firstpartition wall layer 21 on the second partition wall layer 22. Forexample, the first partition wall layer 21 is a silicon oxide film(SiO₂), and a forming method thereof is a CVD method. The manufacturingdevice forms the first partition wall layer 21 to be thinner than theinsulating layer 21′ (see FIG. 4H). Thus, the partition wall 2 havingthe first metal layer 20, the first partition wall layer 21, and thesecond partition wall layer 22 is finally formed. Further, a laminatedstructure having the second partition wall layer 22 and the firstpartition wall layer 21 is finally formed above the photodiodes PDs.

The subsequent processes are the same as those in the method formanufacturing the imaging device 100 described in the first embodiment.As shown in FIG. 10D, the manufacturing device forms the color filtersCFs in regions between adjacent partition walls 20 (that is, above thephotodiodes PDs). Next, as shown in FIG. 10E, the manufacturing deviceforms the micro lens ML above each of the plurality of color filtersCFs. Through the above processes, the imaging device 1008 shown in FIG.8 is finally formed.

Fourth Embodiment

In the first embodiment, an aspect in which only the insulating film 11is disposed between the semiconductor substrate 111 and the partitionwall 2 has been shown. However, in the embodiments of the presentdisclosure, a structure between the semiconductor substrate 111 and thepartition wall 2 is not limited thereto. A light-shielding film may bedisposed between the semiconductor substrate 111 and the partition wall2. Also, this light-shielding film may be made of a metal.

FIG. 11 is a cross-sectional view showing a configuration example of apartition wall 2 and a peripheral portion thereof in an imaging device100C according to a fourth embodiment of the present disclosure. Asshown in FIG. 8 , in the imaging device 100C, a metal light-shieldingfilm 30 (an example of the “light-shielding film” of the presentdisclosure) and an insulating film 31 that covers an upper surface andside surfaces of the metal light-shielding film 30 are provided betweenthe semiconductor substrate 111 and the partition wall 2. For example,the insulating film 11, the metal light-shielding film 30, and theinsulating film 31 are laminated in order from the semiconductorsubstrate 111 side to the partition wall 2 side. The metallight-shielding film 30 prevents light trapped in the second partitionwall layer 22 of the partition wall 2 from being incident on thesemiconductor substrate 111. The metal light-shielding film 30 has ashape that exposes an upper side of the photodiode PD and covers otherregions.

For example, a width W30 of the metal light-shielding film 30 is largerthan a width W20 of the first metal layer 20 of the partition wall 2(W30>W20). Further, the width W30 of the metal light-shielding film 30preferably has a size equal to or larger than a value obtained by addingthe width W20 of the first metal layer 20 of the partition wall 2, athickness W22 of a portion of the second partition wall layer 22 thatcovers the first side surface 20 a of the first metal layer 20, and athickness W22 of a portion of the second partition wall layer 22 thatcovers the second side surface 20 b of the first metal layer 20(W30≥W20+W22×2). Thus, the metal light-shielding film 30 can beinterposed between the second partition wall layer 22 and thesemiconductor substrate 111 and can prevent light from being incidentthe semiconductor substrate 111 from the second partition wall layer 22.

FIG. 12 is a cross-sectional view for explaining light shielding fromthe partition wall 2 side to the semiconductor substrate 111 side in theimaging device 100C according to the fourth embodiment of the presentdisclosure. Also, FIG. 12 shows an aspect in which the insulating film31 shown in FIG. 11 is omitted. As shown in FIG. 12 , light L21 that isincident on the surface of the color filter CF at a high angle, passesthrough the first partition wall layer 21, and is incident on the secondpartition wall layer 22 proceeds to the semiconductor substrate 111 side(downward in FIG. 12 ) while being reflected between the first metallayer 20 and the first partition wall layer 21. When the light L21reaches a surface of the metal light-shielding film 30, it is reflectedby the surface of the first metal layer 20 and proceeds to a sideopposite to the semiconductor substrate 111 (upward in FIG. 12 ).

Thus, the metal light-shielding film 30 can prevent the light L21 frombeing incident on the semiconductor substrate 111 from the secondpartition wall layer 22. The imaging device 100C can further reduce thehigh-angle incident light that reaches the photodiode PD. The imagingdevice 100C can further inhibit deterioration in imaging performance dueto the problem that the high-angle incident light is photoelectricallyconverted and causes color mixing or the like in a pixel signal.

Next, a method for manufacturing the imaging device 100C shown in FIG.12 will be described. FIGS. 13A, 13B, 13C, 13D, 13E, 13F, 13G, and 13Hare cross-sectional views showing the method for manufacturing theimaging device 100C according to the fourth embodiment of the presentdisclosure in the order of processes. In FIG. 13A, processes up to theprocess of forming the insulating film 11 are the same as those in themethod for manufacturing the imaging device 100 described in the firstembodiment. After the insulating film 11 has been formed, themanufacturing device forms a metal film 30′ on the insulating film 11.For example, the metal film 30′ is copper (Cu) or tungsten (W), and aforming method thereof is a CVD method, a vapor deposition method, or asputtering method.

Next, as shown in FIG. 13B, the manufacturing device forms a resistpattern RP3 on the metal film 30′. The resist pattern RP3 has a shapethat exposes an upper side of the photodiode PD and covers otherregions. The resist pattern RP3 has a shape that covers a region servingas the metal light-shielding film 30 (see FIG. 12 ) and exposes otherregions. Next, the manufacturing device dry-etches the metal film 30′using the resist pattern RP3 as a mask. Dry etching is, for example,RIE. Thus, as shown in FIG. 13C, the metal light-shielding film 30 isformed. After that, the manufacturing device removes the resist patternRP3.

Next, the manufacturing device forms an insulating film on theinsulating film 11. The insulating film is, for example, a silicon oxidefilm (SiO₂). Next, the manufacturing device forms a resist pattern (notshown) on the insulating film and dry-etches the insulating film usingthe resist pattern as a mask. Dry etching is, for example, RIE. Thus, asshown in FIG. 13D, the insulating film 31 that covers the upper surfaceand the side surfaces of the metal light-shielding film 30 is formed.Further, in the present embodiment, the dry etching of the insulatingfilm can also be omitted. In that case, the upper side of the photodiodePD is also covered with the insulating film 31.

Next, the manufacturing device forms a metal layer (not shown) above thesemiconductor substrate 111. For example, the metal layer is a thin filmof copper (Cu) or tungsten (W), and a forming method thereof is a CVDmethod, a vapor deposition method, or a sputtering method. Next, themanufacturing device forms a resist pattern (not shown) on theinsulating film and dry-etches the metal film using the resist patternas a mask. Dry etching is, for example, RIE. Thus, as shown in FIG. 13E,the first metal layer 20 is formed on the metal light-shielding film 30via the insulating film 31.

The subsequent processes are the same as those in the method formanufacturing the imaging device 1008 described in the third embodiment.As shown in FIG. 13F, the manufacturing device forms the secondpartition wall layer 22 above the semiconductor substrate 111. Next, asshown in FIG. 13G, the manufacturing device forms the first partitionwall layer 21 on the second partition wall layer 22. Thus, the partitionwall 2 having the first metal layer 20, the first partition wall layer21, and the second partition wall layer 22 is finally formed. Further, alaminated structure having the second partition wall layer 22 and thefirst partition wall layer 21 is finally formed above the photodiodesPDs. Next, as shown in FIG. 13H, the manufacturing device forms thecolor filters CFs in regions between adjacent partition walls 20 (thatis, above the photodiodes PDs). Next, the manufacturing device forms themicro lens (not shown) above each of the plurality of color filters CFs.Through the above processes, the imaging device 100C shown in FIG. 12 isfinally formed.

Fifth Embodiment

In the above embodiment, a case in which the thicknesses W22 (see FIG.11 ) of the second partition wall layers 22 between the plurality ofpixels 102 are the same has been shown. However, the embodiments of thepresent disclosure are not limited thereto. In the embodiments of thepresent disclosure, in the second partition wall layer 22, the thicknessof the portion that covers the first side surface 20 a of the firstmetal layer 20 and the thickness of the portion that covers the secondside surface 20 b may be different from each other.

FIG. 14 is a cross-sectional view showing a configuration example of apartition wall 2 and a peripheral portion thereof in an imaging device100D according to a fifth embodiment of the present disclosure. As shownin FIG. 14 , in the imaging device 100D, a thickness W22B of the secondpartition wall layer 22 of the blue (B) pixel 102, a thickness W22G ofthe second partition wall layer 22 of the green (G) pixel 102, and athickness W22R of the second partition wall layer 22 of the red (R)pixel 102 are different from each other. For example, among thethicknesses W22B, W22G, and W22B, W22B is the smallest and W22R is thelargest. Similarly to wavelengths of the blue (B), green (G), and red(R) colors, the relationship of W22B<W22G<W22R is established. Theimaging device 100D makes the thickness of the second partition walllayer 22 different for each of the blue (B), green (G), and red (R)colors, so that a width and a pixel area of the pixel 102 can be madedifferent for each of the blue (B), green (G), and red (R) colors.

In the imaging device 100D, the high-angle incident light that hasreached the side surface of the first metal layer 20 is also attenuatedwhile being repeatedly reflected between the side surface of the firstmetal layer 20 and the first partition wall layer 21. Accordingly, theimaging device 100D can reduce the high-angle incident light thatreaches the photodiode PD. The imaging device 100D can inhibitdeterioration in imaging performance due to the problem that thehigh-angle incident light is photoelectrically converted and causescolor mixing or the like in a pixel signal.

Next, a method for manufacturing the imaging device 100D shown in FIG.14 will be described. FIGS. 15A and 15B are cross-sectional viewsshowing the method for manufacturing the imaging device 100D accordingto the fifth embodiment of the present disclosure in the order ofprocesses. In FIG. 15A, processes up to the process of forming theinsulating layer 22′ are the same as those in the method formanufacturing the imaging device 100 described in the first embodiment.After the insulating layer 22′ has been formed, the manufacturing deviceforms resist patterns RP5 on the insulating layer 22′ as shown in FIG.15A. The resist patterns RP5 have shapes that cover regions serving asthe first metal layer 20 and the second partition wall layer 22 (seeFIG. 14 ) of the partition wall 2 and expose other regions.

In the imaging device 100, thicknesses of the second partition walllayers 22 between the blue (B), green (G), and red (R) pixels 102 aredifferent from each other. For example, boundary portions between theblue (B), green (G), and red (R) pixels 102 are first metal layers 20,and a thickness of the second partition wall layer 22 formed on thefirst side surface 20 a side of the first metal layer 20 and a thicknessof the second partition wall layer 22 formed on the second side surface20 b side are different from each other. For this reason, a centralposition CRP5 in a width direction of the resist pattern RP5 is deviatedin the width direction from a central position C20 in the widthdirection of the first metal layer 20.

Further, the plurality of resist patterns RP5 have different widthsdepending on their arrangement positions. For example, a width WRP5 of aresist pattern RP5 disposed at a position straddling between the blue(B) pixel 102 and the green (G) pixel 102 is larger than a width WRP5 ofa resist pattern RP5 formed to straddle between the green (G) pixel 102and the red (R) pixel 102.

Next, the manufacturing device dry-etches the insulating layer 22′ usingthe resist patterns RP5 as a mask. Dry etching is, for example, RIE.Thus, as shown in FIG. 15B, the second partition wall layers 22 areformed. After that, the manufacturing device removes the resist patternsRP5.

The subsequent processes are the same as those in the method formanufacturing the imaging device 100 described in the first embodiment.The manufacturing device forms the first partition wall layers 21 (seeFIG. 14 ), forms the color filters CFs (see FIG. 14 ), and forms themicro lenses MLs (see FIG. 14 ). Through the above processes, theimaging device 100D shown in FIG. 14 is finally formed.

Sixth Embodiment

In the embodiments of the present disclosure, widths of the colorfilters CFs may be the same length or different lengths from each otherbetween the plurality of pixels 102. FIG. 16 is a cross-sectional viewshowing a configuration example of a partition wall 2 and a peripheralportion thereof in an imaging device 100E according to a sixthembodiment of the present disclosure. As shown in FIG. 16 , in theimaging device 100E, a width WCFB of the blue (B) color filter CF, awidth WCFG of the green (G) color filter CF, and a width WCFR of the red(R) color filter CF are different from each other.

For example, among the widths WCFB, WCFG, and WCFR, WCFB is the largest,and WCFR is the smallest. Among the blue (B), green (G), and red (R)pixels 102, the red (R) pixel 102 has the highest sensitivity, and theblue (B) pixel 102 has the lowest sensitivity. For this reason, in theimaging device 100D, the width WCFE of the color filter CF is reduced tobring the sensitivity of the red (R) closer to the sensitivity of thegreen (G). Further, the width WCFE of the blue (B) color filter CF isincreased to bring the sensitivity of the blue (B) closer to thesensitivity of the green (G). Contrary to the sensitivities of the blue(B), green (G), and red (R), the relationshp of WCFB>WCFG>WCFR isestablished.

Further, in the imaging device 100E, similarly to the imaging device100D described in the fifth embodiment, the thickness W22B of the secondpartition wall layer 22 of the blue (B) pixel 102, the thickness W22G ofthe second partition wall layer 22 of the green (G) pixel 102, and thethickness W22R of the second partition wall layer 22 of the red (R)pixel 102 may be different from each other.

For example, the relationship of W22B<W22G<W22R may be established. Inthe imaging device 100E, the thickness of the second partition walllayer 22 is made different for each of the blue (B), green (G), and red(R), and thus the blue (B), green (G), and red (R) pixels 102 have thesame width. Specifically, the relationship ofWCFB+W22B×2=WCFG+W22G×2=WCFR+W22R×2 is established. Thus, the blue (B),green (G), and red (R) pixels 102 have the same width, and the microlenses ML disposed on the color filters CFs also have the same width(diameter). In each of the blue (B), green (G), and red (R) pixels 102,the pixel area is made uniform.

In the imaging device 100E, the high-angle incident light that hasreached the side surface of the first metal layer 20 is also attenuatedwhile being repeatedly reflected between the side surface of the firstmetal layer 20 and the first partition wall layer 21. Accordingly, theimaging device 100E can reduce the high-angle incident light thatreaches the photodiode PD. The imaging device 100E can inhibitdeterioration in imaging performance due to the problem that thehigh-angle incident light is photoelectrically converted and causescolor mixing or the like in a pixel signal.

Seventh Embodiment

The semiconductor substrates of the imaging devices according to theembodiments of the present disclosure may be provided with trenchisolation for separating the photodiodes PDs adjacent to each other.Also, the imaging devices according to the embodiments of the presentdisclosure may be subjected to so-called “pupil correction.”

FIG. 17 is a diagram illustrating a central region AR1 and a peripheralregion AR2 of an imaging region configured of a plurality of photodiodesin an imaging device 100F according to a seventh embodiment of thepresent disclosure. FIG. 18 is the imaging device 100F according to theseventh embodiment of the present disclosure and is a cross-sectionalview showing a configuration example of a partition wall 2 and aperipheral portion thereof in the peripheral region AR2 of the imagingregion shown in FIG. 17 .

As shown in FIG. 18 , a trench isolation 5 (an example of the “elementseparation layer” of the present disclosure) that separates onephotodiode PD from another photodiode PD, which are adjacent to eachother, may be provided in the semiconductor substrate 111 of the imagingdevice 100F. The trench isolation 5 is configured of a trench providedin the semiconductor substrate 111 and an insulating film (for example,SiO₂) filled in the trench. The partition wall 2 is located on thetrench isolation 5. Also, in the embodiments of the present disclosure,the trench isolation 5 deeply formed on the semiconductor substrate 111may be referred to as a deep trench isolation (DTI).

In addition, the imaging device 100F is subjected to so-called “pupilcorrection.” For example, the partition wall 2 that separates the colorfilters CFs adjacent to each other is shifted toward the central regionAR1 side of the imaging device by a predetermined distance Wgap withrespect to the trench isolation 5 that separates adjacent photodiodesPDs from each other. This distance (an amount of shift) Wgap increasestoward a side further separated from the central region AR1. Thus, theimaging device 100F can deviate a range of angle at which light can beincident in the peripheral region AR2 toward an upper side of thecentral region AR1, so that light collection efficiency in theperipheral region AR2 can be improved.

Eighth Embodiment

In the embodiments of the present disclosure, the trench isolation 5that separates the photodiodes PDs adjacent to each other may include ametal layer (hereinafter referred to as a second metal layer). Thesecond metal layer included in the trench isolation 5 may be joined orintegrally formed with the first metal layer 20 included in thepartition wall 2 to be integrated therewith, or may be separatedtherefrom.

FIG. 19 is a cross-sectional view showing a configuration example of apartition wall 2 and a peripheral portion thereof in an imaging device100G according to an eighth embodiment of the present disclosure. Asshown in FIG. 19 , the semiconductor substrate 111 of the imaging device100G is provided with a trench isolation 5 that separates adjacentphotodiodes PDs from each other. In the imaging device 100G, the trenchisolation 5 has a second metal layer 50 located in a central portion ofthe trench isolation 5, a first translucent insulating layer 51 thatcovers the second metal layer 50 from an outer side thereof, and asecond insulating layer 52 located between the second metal layer 50 andthe first insulating layer 51. The first insulating layer 51 and thesecond insulating layer correspond to the “insulating layer” of thepresent disclosure.

For example, in a thickness direction of the imaging device 100G (thatis, a normal direction of the light receiving surface 111 a), the secondmetal layer 50 included in the trench isolation 5 and the first metallayer 20 included in the partition wall 2 overlap each other. Similarly,the first insulating layer 51 and the first partition wall layer 21overlap each other, and the second insulating layer 52 and the secondpartition wall layer 22 also overlap each other. A width W50 of thefirst metal layer 20 may be the same as or different from the width W20of the first metal layer 20. FIG. 19 shows a case in which W50=W20, butthis is just an example. W50<W20 may be used, or W50>W20 may be used.

Materials constituting the second metal layer 50, the first insulatinglayer 51, and the second insulating layer 52 are not particularlylimited, but as an example, the second metal layer 50 is made of copper(Cu) or tungsten (W), the first insulating layer 51 is made of a siliconoxide film (SiO2), and the second insulating layer 52 is made of asilicon carbide film (a-SiC) having an amorphous crystal structure.

In a case in which the first metal layer 20 and the second metal layer50 are made of the same material, the first metal layer 20 and thesecond metal layer 50 are easily joined to each other. Further, in acase in which the first metal layer 20 and the second metal layer 50 aremade of the same material, the first metal layer 20 and the second metallayer 50 may be integrally formed. By joining or integrally forming thefirst metal layer 20 and the second metal layer 50 and integrating them,it is possible to improve a joining strength of the partition wall 2 forthe semiconductor substrate 111.

In a case in which the first insulating layer 51 and the first partitionwall layer 21 are made of the same material, the first insulating layer51 and the first partition wall layer 21 are easily joined to eachother, and thus it is possible to improve the joining strength of thepartition wall 2 for the semiconductor substrate 111. Similarly, in acase in which the second insulating layer 52 and the second partitionwall layer 22 are made of the same material, the second insulating layer52 and the second partition wall layer 22 are easily joined to eachother, and thus it is possible to improve the joining strength of thepartition wall 2 for the semiconductor substrate 111.

Next, a method for manufacturing the imaging device 100G shown in FIG.19 will be described. FIGS. 20A, 20B, 20C, 20D, 20E, 20F, and 20G arecross-sectional views showing the method for manufacturing the imagingdevice 100G according to the eighth embodiment of the present disclosurein the order of processes. As shown in FIG. 20A, the manufacturingdevice forms the insulating film 11 on the light receiving surface 111 aof the semiconductor substrate 111 on which the photodiode PD is formed.Next, the manufacturing device etches the insulating film 11 and thesemiconductor substrate 111 to form a trench H1. The trench H1 is formedbetween one photodiode PD1 and another photodiode PD which are adjacentto each other. Next, as shown in FIG. 20B, the manufacturing deviceforms an insulating layer 51′ on the light receiving surface 111 a sideof the semiconductor substrate 111 to fill the trench H1. For example,the insulating layer 51′ is a silicon oxide film (SiO2), and a formingmethod thereof is a CVD method. Next, the manufacturing device performsa CMP treatment to a surface of the insulating layer 51′ to flatten thesurface of the insulating layer 51′.

Next, as shown in FIG. 20C, the manufacturing device forms a resistpattern RP6 on the insulating layer 51′. The resist pattern RP6 has ashape that opens a region in which the second metal layer 50 (see FIG.19 ) is formed and a region in which the second insulating layer 52 (seeFIG. 19 ) is formed in the trench isolation 5 and covers other regions.Next, the manufacturing device dry-etches the insulating layer 51′ usingthe resist pattern RP6 as a mask. Thus, as shown in FIG. 20C, the firstinsulating layer 51 disposed in the trench H1 is formed. After the firstinsulating layer 51 has been formed, the manufacturing device removesthe resist pattern RP6.

Next, as shown in FIG. 20D, the manufacturing device forms an insulatinglayer 52′ above the light receiving surface 111 a. For example, theinsulating layer 52′ is a silicon carbide film (a-SiC) having anamorphous crystal structure, and a forming method thereof is a CVDmethod. Next, the manufacturing device partially dry-etches theinsulating layer 52′ and removes the insulating layer 52′ from regionsother than the trench H1. The insulating layer 52′ remaining in thetrench H1 becomes the second insulating layer 52. Also, in the presentembodiment, dry etching of the insulating layer 52′ may be omitted. Inthis case, the entire semiconductor substrate 111 on the light receivingsurface 111 a side has a structure in which it is covered with theinsulating layer 52′ (that is, the second insulating layer 52).

Next, as shown in FIG. 20E, the manufacturing device forms a metal layer50′ on the light receiving surface 111 a side. For example, the metallayer 50′ is a thin film of copper (Cu) or tungsten (W), and a formingmethod thereof is a vapor deposition or sputtering method. The trench H1has a structure in which it is filled with the first insulating layer51, the second insulating layer 52, and the metal layer 50′.

Next, as shown in FIG. 20F, the manufacturing device forms a resistpattern RP7 on the metal layer 50′. The resist pattern RP7 has a shapethat covers a region serving as the first metal layer 20 (see FIG. 2 )and exposes other regions. Next, the manufacturing device dry-etches themetal layer 50′ using the resist pattern RP7 as a mask. Thus, as shownin FIG. 20G, the first metal layer 20 and the second metal layer 50 areformed from the metal layer 50′. By forming the second metal layer 50,the trench isolation 5 is finally formed. After that, the manufacturingdevice removes the resist pattern RP7.

The subsequent processes are, for example, the same as those in themethod for manufacturing the imaging device 100 described in the firstembodiment. Through the processes shown in FIGS. 4E, 4F, 4G, 4H, 4I, 4J,and 4K, the imaging device 100G shown in FIG. 19 is finally formed.

Ninth Embodiment

In the embodiments of the present disclosure, a light-shielding film maybe disposed between the second metal layer 50 of the trench isolation 5and the first metal layer 20 of the partition wall 2. Also, thislight-shielding film may be made of a metal.

FIG. 21 is a cross-sectional view showing a configuration example of apartition wall 2 and a peripheral portion thereof in an imaging device100H according to a ninth embodiment of the present disclosure. As shownin FIG. 21 , in the imaging device 100H, the metal light-shielding film30 and the insulating film 31 that cover the upper surface and sidesurfaces of the metal light-shielding film 30 are provided between thesecond metal layer 50 of the trench isolation 5 and the first metallayer 20 of the partition wall 2. The metal light-shielding film 30 andthe insulating film 31 are laminated in order from the trench isolation5 side to the partition wall 2 side. The metal light-shielding film 30prevents light trapped in the second partition wall layer 22 of thepartition wall 2 from entering the trench isolation 5.

For example, the width W30 of the metal light-shielding film 30 islarger than the width W50 of the second metal layer 50 (W30>W50).Further, the width W30 of the metal light-shielding film 30 preferablyhas a size equal to or larger than a value obtained by adding the widthW50 of the second metal layer 50, a thickness W52 of a portion of thesecond insulating layer 52 that covers one side surface of the secondmetal layer 50, and a thickness W52 of a portion of the secondinsulating layer 52 that covers another side surface of the second metallayer 50 (W30≥W50+W52×2). Thus, the metal light-shielding film 30 cancover the second metal layer 50 and the second insulating layer 52. Themetal light-shielding film 30 can prevent light from entering the secondmetal layer 50 and the second insulating layer 52 from the secondpartition wall layer 22.

Next, a method for manufacturing the imaging device 100H shown in FIG.21 will be described. FIGS. 22A, 22B, 22C, 22D, 22E, 22F, 22G, 22H, 22I,22J, 22K, and 22L are cross-sectional views showing the method formanufacturing the imaging device 100H according to the ninth embodimentof the present disclosure in the order of processes. In FIG. 22A,processes up to the process of forming the trench H1 are the same asthose in the method for manufacturing the imaging device 100G describedin the eighth embodiment. After the trench H1 has been formed, as shownin FIG. 22B, the manufacturing device forms the insulating layer 51′ onthe insulating film 11. For example, the insulating layer 51′ is asilicon oxide film (SiO₂), and a forming method thereof is a CVD method.

Next, as shown in FIG. 22C, the manufacturing device forms theinsulating layer 52′ on the insulating layer 51′ to fill the trench H1.For example, the insulating layer 52′ is a silicon carbide film (a-SiC)having an amorphous crystal structure, and a forming method thereof is aCVD method. Next, as shown in FIG. 22D, the manufacturing deviceperforms a CMP treatment to the surface of the insulating layer 52′ toremove the insulating layer 52′ from the regions other than the trenchH1. Further, the manufacturing device also performs a CMP treatment tothe surface of the insulating layer 51′ exposed from below theinsulating layer 52′ to remove the insulating layer 51′ from the regionsother than the trench H1. Thus, the first insulating layer 51 disposedin the trench H1 is formed. Also, in the present embodiment, the CMPtreatment for the insulating layer 51′ may be omitted. In this case, theentire semiconductor substrate 111 on the light receiving surface 111 aside has a structure in which it is covered with the insulating layer51′ (that is, the first insulating layer 51).

Next, as shown in FIG. 22E, the manufacturing device forms a resistpattern RP8 on the light receiving surface 111 a side of thesemiconductor substrate 111. The resist pattern RP8 has a shape thatopens a region of the trench isolation 5 in which the second metal layer50 (see FIG. 21 ) is formed and covers other regions. Next, themanufacturing device dry-etches the insulating layer 52′ using theresist pattern RP8 as a mask. Thus, the second insulating layer 52disposed in the trench H1 is formed. After the second insulating layer52 has been formed, the manufacturing device removes the resist patternRP8.

Next, as shown in FIG. 22F, the manufacturing device forms the metallayer 50′ on the light receiving surface 111 a side. For example, themetal layer 50′ is a thin film of copper (Cu) or tungsten (W), and aforming method thereof is a vapor deposition or sputtering method. Thetrench H1 has a structure in which it is filled with the firstinsulating layer 51, the second insulating layer 52, and the metal layer50′.

Next, as shown in FIG. 20G, the manufacturing device forms a resistpattern RP9 on the metal layer 50′. The resist pattern RP9 has a shapethat covers the region serving as the metal light-shielding film 30 (seeFIG. 21 ) and exposes other regions. Next, the manufacturing devicedry-etches the metal layer 50′ using the resist pattern RP8 as a mask.Thus, the second metal layer 50 of the trench isolation 5 and the metallight-shielding film 30 are formed from the metal layer 50′. By formingthe second metal layer 50, the trench isolation 5 is finally formed.After that, the manufacturing device removes the resist pattern RP9.

Next, as shown in FIG. 22H, the manufacturing device forms theinsulating film 31 on the light receiving surface 111 a side of thesemiconductor substrate 111 to cover the metal light-shielding film 30.The method for forming the insulating film 31 is, for example, a CVDmethod. Next, as shown in FIG. 22I, the manufacturing device forms themetal layer 20′ on the light receiving surface 111 a side. The methodfor forming the metal layer 20′ is, for example, a vapor deposition orsputtering method. Next, as shown in FIG. 22J, the manufacturing deviceforms a resist pattern RP10 on the metal layer 20′. The resist patternRP10 has a shape that covers the region serving as the first metal layer20 (see FIG. 21 ) and exposes other regions. Next, the manufacturingdevice dry-etches the metal layer 20′ using the resist pattern RP10 as amask. Thus, the first metal layer 20 is formed from the metal layer 20′.After that, the manufacturing device removes the resist pattern RP10.

Next, as shown in FIG. 22K, the manufacturing device forms theinsulating layer 22′ above the light receiving surface 111 a. Forexample, the insulating layer 22′ is a silicon carbide film (a-SiC)having an amorphous crystal structure, and a forming method thereof is aCVD method. Next, as shown in FIG. 22L, the manufacturing device forms aresist pattern RP11 on the insulating layer 22′. The resist pattern RP11has a shape that covers the regions serving as the first metal layer 20and the second partition wall layer 22 (see FIG. 21 ) and exposes otherregions. Next, the manufacturing device dry-etches the insulating layer22′ using the resist pattern RP10 as a mask. Thus, the second partitionwall layer 22 is formed from the insulating layer 22′. After that, themanufacturing device removes the resist pattern RP10.

The subsequent processes are, for example, the same as those in themethod for manufacturing the imaging device 100 described in the firstembodiment. Through the processes shown in FIGS. 4H, 4I, 4J, and 4K, theimaging device 100H shown in FIG. 21 is finally formed.

Other Embodiments

While the present disclosure has been described on the basis of theembodiments and modified examples as described above, the descriptionsand figures that constitute parts of the disclosure are not intended tobe understood as limiting the present disclosure. Various alternativeembodiments, examples, and operable techniques will be apparent to thoseskilled in the art from this disclosure. It goes without saying that thetechnique according to the present disclosure (the present technique)includes various embodiments and the like that have not been describedherein. At least one of various omissions, substitutions, andmodifications of constituent elements may be performed without departingfrom the gist of the embodiments described above. Further, the effectsdescribed in the present specification are merely exemplary and notintended as limiting, and other effects may be provided.

<Example of Application to Electronic Device>

For example, the technique according to the present disclosure (thepresent technique) can be applied to various electronic devices such asan imaging system such as a digital still camera, a digital videocamera, or the like (hereinafter collectively referred to as a camera),a mobile device such as a mobile phone having an imaging function, orother devices having an imaging function.

FIG. 23 is a conceptual diagram showing an example in which thetechnique according to the present disclosure (the present technique) isapplied to an electronic device 300. As shown in FIG. 23 , theelectronic device 300 is, for example, a camera and has a solid-stateimaging device 201, an optical lens 210, a shutter device 211, a drivecircuit 212, and a signal processing circuit 213. The optical lens 210is an example of the “optical component” of the present disclosure.

Light transmitted through the optical lens 210 is incident on thesolid-state imaging device 201. For example, the optical lens 210 formsan image of image light (incident light) from a subject on an imagingsurface of the solid-state imaging device 201. Thus, signal charges areaccumulated in the solid-state imaging device 201 for a certain periodof time. The shutter device 211 controls a light irradiation period anda light blocking period for the solid-state imaging device 201. Thedrive circuit 212 supplies a drive signal for controlling a transferoperation or the like of the solid-state imaging device 201 and ashutter operation of the shutter device 211. Signal transfer of thesolid-state imaging device 201 is performed by the drive signal (timingsignal) supplied from the drive circuit 212. The signal processingcircuit 213 performs various signal processing. For example, the signalprocessing circuit 213 processes a signal output from the solid-stateimaging device 201. A video signal that has undergone signal processingis stored in a storage medium such as a memory, or is output to amonitor.

Also, the shutter operation in the electronic device 300 may be realizedby an electronic shutter (for example, a global shutter) operated by thesolid-state imaging device 201 instead of a mechanical shutter. In acase in which the shutter operation in the electronic device 300 isrealized by the electronic shutter, the shutter device 211 in FIG. 23may be omitted.

In the electronic device 300, any one or more of the above-describedimaging devices 100, 100A, 100B, 100C, 100D, 100E, 100F, 100G, and 100His applied to the solid-state imaging device 201. Thus, it is possibleto obtain the electronic device 300 with improved performance. Also, theelectronic device 300 is not limited to the camera. The electronicdevice 300 may be a mobile device such as a mobile phone having animaging function, or other devices having an imaging function.

<Example of Application to Endoscopic Operation System>

The technique according to the present disclosure (the presenttechnique) can be applied to various products. For example, thetechnique according to the present disclosure may be applied to anendoscopic operation system.

FIG. 24 is a diagram showing an example of a schematic configuration ofan endoscopic operation system to which the technique according to thepresent disclosure (the present technique) may be applied.

FIG. 24 shows a situation in which an operator (doctor) 11131 isperforming an operation on a patient 11132 on a patient bed 11133 usingthe endoscopic operation system 11000. As illustrated, the endoscopicoperation system 11000 is configured of an endoscope 11100, othersurgical instruments 11110 such as a pneumoperitoneum tube 11111 and anenergized treatment tool 11112, a support arm device 11120 that supportsthe endoscope 11100, and a cart 11200 equipped with various devices forendoscopic operations.

The endoscope 11100 is configured of a lens barrel 11101, a region ofwhich having a predetermined length from a tip is inserted into a bodycavity of the patient 11132, and a camera head 11102 connected to a baseend of the lens barrel 11101. Although the endoscope 11100 configured asa so-called rigid mirror having the rigid lens barrel 11101 isillustrated in the illustrated example, the endoscope 11100 may beconfigured as a so-called flexible mirror having a flexible lens barrel.

An opening portion into which an objective lens is fitted is provided atthe tip of the lens barrel 11101. A light source device 11203 isconnected to the endoscope 11100, and light generated by the lightsource device 11203 is guided to the tip of the lens barrel by a lightguide provided to extend inside the lens barrel 11101 and is radiatedtoward an observation target in the body cavity of the patient 11132 viathe objective lens. Also, the endoscope 11100 may be a forward-viewingendoscope, a perspective-viewing endoscope, or a side-viewing endoscope.

An optical system and an imaging element are provided inside the camerahead 11102, and the reflected light (observation light) from theobservation target is condensed on the imaging element by the opticalsystem. The observation light is photoelectrically converted by theimaging element, and an electrical signal corresponding to theobservation light, that is, an image signal corresponding to an observedimage is generated. The image signal is transmitted as RAW data to acamera control unit (CCU) 11201.

The CCU 11201 is configured of a central processing unit (CPU), agraphics processing unit (GPU) or the like, and comprehensively controlsoperations of the endoscope 11100 and a display device 11202. Further,the CCU 11201 receives the image signal from the camera head 11102 andperforms various types of image processing for displaying an image basedon the image signal, for example, development processing (demosaicprocessing) and the like, on the image signal.

The display device 11202 displays the image based on the image signalthat has been subjected to image processing by the CCU 11201 under thecontrol of the CCU 11201.

The light source device 11203 is configured of, for example, a lightsource such as a light emitting diode (LED) and supplies irradiationlight, which is used when a surgical part or the like is imaged, to theendoscope 11100.

An input device 11204 is an input interface for the endoscopic operationsystem 11000. A user can input various types of information orinstructions to the endoscopic operation system 11000 via the inputdevice 11204. For example, the user inputs an instruction to changeimaging conditions (a type of irradiation light, a magnification, afocal length, or the like) of the endoscope 11100, or the like.

A treatment tool control device 11205 controls driving of the energizedtreatment tool 11112 for cauterizing or incising tissue, sealing a bloodvessel, or the like. A pneumoperitoneum device 11206 sends a gas intothe body cavity through a pneumoperitoneum tube 11111 in order toinflate the body cavity of the patient 11132 for the purpose of securinga visual field for the endoscope 11100 and a working space for theoperator. A recorder 11207 is a device capable of recording variousinformation regarding the operation. A printer 11208 is a device thatcan print various types of information regarding the operation invarious formats such as text, images, or graphs.

In addition, the light source device 11203 that supplies the endoscope11100 with the irradiation light used when the surgical part is imagedcan be configured of, for example, an LED, a laser light source, or awhite light source configured of a combination thereof. In a case inwhich a white light source is configured by a combination of RGB laserlight sources, it is possible to control an output intensity and anoutput timing of each color (each wavelength) with high accuracy, andthus white balance of captured images can be adjusted in the lightsource device 11203. Further, in this case, laser light from each of therespective RGB laser light sources is radiated to the observation targetin a time-division manner, and driving of the imaging element of thecamera head 11102 is controlled in synchronization with a radiationtiming, so that it is also possible to capture images corresponding toeach of RGB in a time-division manner. According to this method, it ispossible to obtain a color image without providing a color filter to theimaging element.

Further, the driving of the light source device 11203 may be controlledto change intensity of the output light at predetermined time intervals.By controlling the driving of the imaging element of the camera head11102 in synchronization with a timing of changing the intensity of thelight to acquire images in a time-division manner and combine theimages, it is possible to generate a high dynamic range image withoutso-called blackout and whiteout.

Further, the light source device 11203 may be configured to be able tosupply light having a predetermined wavelength band corresponding tospecial light observation. In the special light observation, forexample, by emitting light in a narrower band than irradiation light(that is, white light) during normal observation using wavelengthdependence of light absorption in a body tissue, so-called narrow bandlight observation (narrow band imaging) in which a predetermined tissuesuch as a blood vessel in the mucous membrane surface layer is imagedwith a high contrast is performed. Alternatively, in the special lightobservation, fluorescence observation in which an image is obtained byfluorescence generated by emitting excitation light may be performed.The fluorescence observation can be performed by emitting excitationlight to a body tissue and observing fluorescence from the body tissue(autofluorescence observation), or locally injecting a reagent such asindocyanine green (ICG) to a body tissue and emitting excitation lightcorresponding to a fluorescence wavelength of the reagent to the bodytissue to obtain a fluorescence image. The light source device 11203 maybe configured to be able to supply narrow band light and/or excitationlight corresponding to such special light observation.

FIG. 25 is a block diagram illustrating an example of a functionalconfiguration of the camera head 11102 and CCU 11201 shown in FIG. 24 .

The camera head 11102 has a lens unit 11401, an imaging unit 11402, adriving unit 11403, a communication unit 11404, and a camera headcontrol unit 11405. The CCU 11201 has a communication unit 11411, animage processing unit 11412, and a control unit 11413. The camera head11102 and the CCU 11201 are connected to each other via a transmissioncable 11400 so that they can communicate with each other.

The lens unit 11401 is an optical system provided at a portion forconnection to the lens barrel 11101. The observation light taken in fromthe tip of the lens barrel 11101 is guided to the camera head 11102 andincident on the lens unit 11401. The lens unit 11401 is configured of acombination of a plurality of lenses including a zoom lens and a focuslens.

The imaging unit 11402 is configured of an imaging element. The imagingelement constituting the imaging unit 11402 may be one element(so-called single plate type) or a plurality of elements (so-calledmulti-plate type). In a case in which the imaging unit 11402 isconfigured of a multi-plate type, for example, image signalscorresponding to RGBs may be generated by imaging elements and combinedwith each other, so that a color image may be obtained. Alternatively,the imaging unit 11402 may be configured to have a pair of imagingelements for acquiring image signals for the right eye and the left eyecorresponding to three-dimensional (3D) display. By performing the 3Ddisplay, the operator 11131 will be able to determine a depth ofbiological tissue in the surgical part more accurately. In addition, ina case in which the imaging unit 11402 is configured as a multi-platetype, a plurality of lens units 11401 may be provided to correspond tothe imaging elements.

Further, the imaging unit 11402 may not necessarily be provided in thecamera head 11102. For example, the imaging unit 11402 may be providedimmediately after the objective lens inside the lens barrel 11101.

The driving unit 11403 is configured of an actuator and moves the zoomlens and the focus lens of the lens unit 11401 by a predetermineddistance along an optical axis under the control of the camera headcontrol unit 11405. Thus, the magnification and focus of the imagecaptured by the imaging unit 11402 can be adjusted appropriately.

The communication unit 11404 is configured of a communication device fortransmitting or receiving various information to or from the CCU 11201.The communication unit 11404 transmits an image signal obtained from theimaging unit 11402 to the CCU 11201 through the transmission cable 11400as RAW data.

Further, the communication unit 11404 receives a control signal forcontrolling the driving of the camera head 11102 from the CCU 11201 andsupplies the control signal to the camera head control unit 11405. Thecontrol signal includes, for example, information on imaging conditionssuch as information for designating a frame rate of a captured image,information for designating an exposure value at the time of imaging,and/or information for designating a magnification and a focus of thecaptured image.

Also, the imaging conditions such as the frame rate, the exposure value,the magnification, and the focus described above may be appropriatelydesignated by the user or may be automatically set by the control unit11413 of the CCU 11201 on the basis of the acquired image signal. In thelatter case, a so-called auto exposure (AE) function, auto focus (AF)function and auto white balance (AWB) function are provided in theendoscope 11100.

The camera head control unit 11405 controls the driving of the camerahead 11102 on the basis of the control signal from the CCU 11201received via the communication unit 11404.

The communication unit 11411 is configured of a communication device fortransmitting and receiving various types of information to and from thecamera head 11102. The communication unit 11411 receives an image signaltransmitted from the camera head 11102 via the transmission cable 11400.

In addition, the communication unit 11411 transmits a control signal forcontrolling the driving of the camera head 11102 to the camera head11102. The image signal or the control signal can be transmitted throughelectric communication, optical communication, or the like.

The image processing unit 11412 performs various kinds of imageprocessing on the image signal that is the RAW data transmitted from thecamera head 11102.

The control unit 11413 performs various kinds of control regardingimaging of the surgical part or the like using the endoscope 11100 anddisplay of a captured image obtained by imaging the surgical part or thelike. For example, the control unit 11413 generates the control signalfor controlling the driving of the camera head 11102.

Further, the control unit 11413 causes the display device 11202 todisplay the captured image obtained by imaging the surgical part or thelike on the basis of the image signal that has been subjected to theimage processing by the image processing unit 11412. In this case, thecontrol unit 11413 may recognize various objects in the captured imageusing various image recognition techniques. For example, the controlunit 11413 can recognize surgical tools such as forceps, specificbiological parts, bleeding, mist when the energized treatment tool 11112is used, and the like by detecting an edge shape, a color, and the likeof an object included in the captured image. When the control unit 11413causes the display device 11202 to display the captured image, it maycause various types of surgical support information to be superimposedand displayed with the image of the surgical part using the recognitionresult. The surgical support information is superimposed and displayed,and presented to the operator 11131, so that a burden on the operator11131 can be reduced and the operator 11131 can surely proceed with theoperation.

The transmission cable 11400 that connects the camera head 11102 to theCCU 11201 is an electrical signal cable compatible with communication ofan electrical signal, an optical fiber compatible with opticalcommunication, or a composite cable thereof.

Here, in the illustrated example, wired communication is performed usingthe transmission cable 11400, but the communication between the camerahead 11102 and the CCU 11201 may be performed wirelessly.

An example of the endoscopic operation system to which the techniqueaccording to the present disclosure can be applied has been describedabove. The technique according to the present disclosure may be appliedto, for example, the endoscope 11100, the imaging unit 11402 of thecamera head 11102, the image processing unit 11412 of the CCU 11201, andthe like among the configurations described above. Specifically, any oneor more of the above-mentioned imaging devices 100, 100A, 100B, 100C,100D, 100E, 100F, 100G, and 100H can be applied to the imaging unit10402. By applying the technique according to the present disclosure tothe endoscope 11100, the imaging unit 11402 of the camera head 11102,the image processing unit 11412 of the CCU 11201, and the like, aclearer image of the surgical part can be obtained, and thus theoperator can surely confirm the surgical part. Further, by applying thetechnique according to the present disclosure to the endoscope 11100,the imaging unit 11402 of the camera head 11102, the image processingunit 11412 of the CCU 11201, and the like, an image of the surgical partcan be obtained with lower latency, and thus it is possible to perform atreatment with the same feeling as when the operator is observing thesurgical part by touch.

Also, the endoscopic operation system has been described as an example,but in addition thereto, the technique according to the presentdisclosure may be applied to, for example, a microscopic operationsystem.

<Example of Application to Mobile Object>

The technique according to the present disclosure (the presenttechnique) can be applied in various products. For example, thetechnique according to the present disclosure may be realized as adevice mounted in any type of mobile objects such as automobiles,electric vehicles, hybrid electric vehicles, motorbikes, bicycles,personal mobility, airplanes, drones, ships, and robots.

FIG. 26 is a block diagram showing a schematic configuration example ofa vehicle control system that is an example of a mobile object controlsystem to which the technique according to the present disclosure may beapplied.

A vehicle control system 12000 includes a plurality of electroniccontrol units connected to each other via a communication network 12001.In the example shown in FIG. 26 , the vehicle control system 12000includes a drive system control unit 12010, a body system control unit12020, a vehicle external information detection unit 12030, a vehicleinternal information detection unit 12040, and an integrated controlunit 12050. In addition, as functional configurations of the integratedcontrol unit 12050, a microcomputer 12051, a sound image output unit12052, and an in-vehicle network interface (I/F) 12053 are shown.

The drive system control unit 12010 controls operations of devicesrelated to the drive system of the vehicle in accordance with variousprograms. For example, the drive system control unit 12010 functions asa driving force generation device for generating a driving force of avehicle such as an internal combustion engine or a driving motor, adriving force transmission mechanism for transmitting a driving force towheels, a steering mechanism for adjusting a steering angle of avehicle, and a control device such as a braking device that generates abraking force of a vehicle.

The body system control unit 12020 controls operations of variousdevices equipped in a vehicle body in accordance with various programs.For example, the body system control unit 12020 functions as a controldevice of a keyless entry system, a smart key system, a power windowdevice, or various lamps such as a head lamp, a back lamp, a brake lamp,and a turn signal or fog lamp. In this case, radio waves transmittedfrom a portable device that substitutes for a key or signals of variousswitches may be input to the body system control unit 12020. The bodysystem control unit 12020 receives inputs of these radio waves orsignals and controls a door lock device, a power window device, a lamp,and the like of a vehicle.

The vehicle external information detection unit 12030 detectsinformation outside the vehicle in which the vehicle control system12000 is mounted. For example, an imaging unit 12031 is connected to thevehicle external information detection unit 12030. The vehicle externalinformation detection unit 12030 causes the imaging unit 12031 tocapture an image outside the vehicle and receives the captured image.The vehicle external information detection unit 12030 may perform objectdetection processing or distance detection processing for people, cars,obstacles, signs, and letters on a road on the basis of the receivedimage.

The imaging unit 12031 is an optical sensor that receives light andoutputs an electrical signal corresponding to an amount of the receivedlight. The imaging unit 12031 can output the electrical signal as animage or as ranging information. In addition, the light received by theimaging unit 12031 may be visible light or invisible light such asinfrared rays.

The vehicle internal information detection unit 12040 detectsinformation inside the vehicle. For example, a driver state detectionunit 12041 that detects a state of a driver is connected to the vehicleinternal information detection unit 12040. The driver state detectionunit 12041 includes, for example, a camera that captures an image of thedriver, and the vehicle internal information detection unit 12040 maycalculate a degree of fatigue or concentration of the driver or maydetermine whether or not the driver is dozing on the basis of detectioninformation input from the driver state detection unit 12041.

The microcomputer 12051 can calculate a control target value of thedriving force generation device, the steering mechanism, or the brakingdevice on the basis of information inside and outside the vehicleacquired by the vehicle external information detection unit 12030 or thevehicle internal information detection unit 12040, and output a controlcommand to the drive system control unit 12010. For example, themicrocomputer 12051 can perform cooperative control for the purpose ofrealizing functions of an advanced driver assistance system (ADAS)including vehicle collision avoidance, impact mitigation, followingtraveling based on an inter-vehicle distance, vehicle speed maintenancedriving, vehicle collision warning, vehicle lane deviation warning, andthe like.

Further, by controlling the driving force generation device, thesteering mechanism, the braking device, and the like on the basis ofinformation regarding the vicinity of the vehicle acquired by thevehicle external information detection unit 12030 or the vehicleinternal information detection unit 12040, the microcomputer 12051 canperform cooperative control for the purpose of automated driving or thelike in which autonomous travel is performed without depending on anoperation of the driver.

In addition, the microcomputer 12051 can output a control command to thebody system control unit 12020 on the basis of the information outsidethe vehicle acquired by the vehicle external information detection unit12030. For example, the microcomputer 12051 can perform cooperativecontrol for the purpose of controlling headlamps in accordance with aposition of a preceding vehicle or an oncoming vehicle detected by thevehicle external information detection unit 12030 and achievingantiglare by switching a high beam to a low beam, or the like.

The sound image output unit 12052 transmits an output signal of at leastone of audio and an image to an output device capable of visually oraudibly notifying an occupant of a vehicle or the outside of the vehicleof information. In the example of FIG. 26 , an audio speaker 12061, adisplay unit 12062, and an instrument panel 12063 are illustrated asoutput devices. The display unit 12062 may include, for example, atleast one of an onboard display and a head-up display.

FIG. 27 is a diagram showing an example of an installation position ofthe imaging unit 12031.

In FIG. 27 , a vehicle 12100 includes imaging units 12101, 12102, 12103,12104, and 12105 as the imaging unit 12031.

The imaging units 12101, 12102, 12103, 12104, and 12105 are provided atpositions such as a front nose, side-view mirrors, a rear bumper, a backdoor, and an upper portion of a windshield in a vehicle interior of thevehicle 12100, for example. The imaging unit 12101 provided on the frontnose and the imaging unit 12105 provided in the upper portion of thewindshield in the vehicle interior mainly acquire images in front of thevehicle 12100. The imaging units 12102 and 12103 provided on the sidemirrors mainly acquire images on a lateral side of the vehicle 12100.The imaging unit 12104 provided on the rear bumper or the back doormainly acquires images behind the vehicle 12100. Front view imagesacquired by the imaging units 12101 and 12105 are mainly used fordetection of preceding vehicles, pedestrians, obstacles, trafficsignals, traffic signs, lanes, and the like.

Also, FIG. 27 shows an example of imaging ranges of the imaging units12101 to 12104. An imaging range 12111 indicates an imaging range of theimaging unit 12101 provided at the front nose, imaging ranges 12112 and12113 respectively indicate imaging ranges of the imaging units 12102and 12103 provided at the side mirrors, and an imaging range 12114indicates an imaging range of the imaging unit 12104 provided at therear bumper or the back door. For example, a bird's-eye view image ofthe vehicle 12100 as viewed from above can be obtained by superimposingimage data captured by the imaging units 12101 to 12104.

At least one of the imaging units 12101 to 12104 may have a function ofacquiring distance information. For example, at least one of the imagingunits 12101 to 12104 may be a stereo camera configured of a plurality ofimaging elements or may be an imaging element having pixels for phasedifference detection.

For example, by obtaining distances to each three-dimensional objectwithin the imaging range 12111 to 12114 and changes of the distancesover time (relative velocity with respect to the vehicle 12100) on thebasis of distance information obtained from the imaging units 12101 to12104, the microcomputer 12051 can extract, particularly, the closestthree-dimensional object on a traveling path of the vehicle 12100, whichis a three-dimensional object traveling at a predetermined speed (forexample, 0 km/h or higher) in the substantially same direction as thevehicle 12100, as a preceding vehicle. Further, the microcomputer 12051can set an inter-vehicle distance to be secured in advance from thepreceding vehicle and can perform automated braking control (alsoincluding following stop control) or automated acceleration control(also including following start control). In this way, it is possible toperform cooperative control for the purpose of automated driving or thelike in which autonomous travel is performed without depending on anoperation of the driver.

For example, the microcomputer 12051 can classify and extractthree-dimensional object data regarding three-dimensional objects intotwo-wheeled vehicles, ordinary vehicles, large vehicles, pedestrians,and other three-dimensional objects such as utility poles on the basisof the distance information obtained from the imaging units 12101 to12104 and use the three-dimensional object data for automatic avoidanceof obstacles. For example, the microcomputer 12051 identifies obstaclesin the vicinity of the vehicle 12100 into obstacles that can be visuallyrecognized by the driver of the vehicle 12100 and obstacles that aredifficult to be visually recognized. In addition, the microcomputer12051 determines a collision risk indicating a degree of risk ofcollision with each obstacle, and when the collision risk is equal to orgreater than a set value and there is a possibility of collision,outputs a warning to the driver via the audio speaker 12061 or thedisplay unit 12062 and performs forced deceleration or avoidancesteering via the drive system control unit 12010, so that it can performdriving assistance for collision avoidance.

At least one of the imaging units 12101 to 12104 may be an infraredcamera that detects infrared light. For example, the microcomputer 12051can recognize a pedestrian by determining whether or not a pedestrian ispresent in captured images of the imaging units 12101 to 12104. Suchrecognition of a pedestrian is performed through, for example, aprocedure of extracting feature points in the captured images of theimaging units 12101 to 12104 serving as infrared cameras, and aprocedure of performing pattern matching processing on a series offeature points indicating a contour of an object to determine whether ornot the object is a pedestrian. When the microcomputer 12051 determinesthat a pedestrian is present in the captured images of the imaging units12101 to 12104 and recognizes the pedestrian, the sound image outputunit 12052 controls the display unit 12062 such that a square contourline for emphasis is superimposed on the recognized pedestrian and isdisplayed. In addition, the sound image output unit 12052 may controlthe display unit 12062 so that an icon or the like indicating apedestrian is displayed at a desired position.

An example of the vehicle control system to which the techniqueaccording to the present disclosure may be applied has been describedabove. The technique according to the present disclosure may be appliedto the imaging unit 12031 and the like among the above-describedconfigurations. Specifically, any one or more of the above-mentionedimaging devices 100, 100A, 100B, 100C, 100D, 100E, 100F, 100G, and 100Hcan be applied to the imaging unit 12031. By applying the techniqueaccording to the present disclosure to the imaging unit 12031, a clearercaptured image can be obtained, and thus it is possible to reduce adriver's fatigue. In addition, the present disclosure can also adopt thefollowing configurations.

(1) An imaging device including:

-   a semiconductor substrate including a plurality of photoelectric    conversion elements;-   a plurality of color filters that are provided on the semiconductor    substrate and face each of the plurality of photoelectric conversion    elements; and-   a partition wall that is provided on the semiconductor substrate and    provides separation between one color filter and another color    filter adjacent to each other among the plurality of color filters,-   wherein the partition wall includes a first metal layer,-   a first translucent partition wall layer that covers a side surface    of the first metal layer, and-   a second translucent partition wall layer located between the first    metal layer and the first partition wall layer, and-   a refractive index of the second partition wall layer is larger than    a refractive index of the first partition wall layer.

(2) The imaging device according to the above (1), wherein refractiveindexes of the color filters are larger than the refractive index of thefirst partition wall layer.

(3) The imaging device according to the above (1) or (2) furtherincluding a lens disposed on a side opposite to the semiconductorsubstrate with the color filters interposed therebetween,

-   wherein the first metal layer includes an end surface located on the    lens side,-   the second partition wall layer covers the end surface of the first    metal layer, and-   the first partition wall layer covers the end surface via the second    partition wall layer.

(4) The imaging device according to any one of the above (1) to (3),wherein the second partition wall layer, the first partition wall layer,and the color filters are laminated in order on the photoelectricconversion elements.

(5) The imaging device according to any one of the above (1) to (4)further including a light-shielding film disposed between the partitionwall and the semiconductor substrate.

(6) The imaging device according to the above (5), wherein thelight-shielding film is made of a metal.

(7) The imaging device according to any one of the above (1) to (6),wherein the side surface of the first metal layer includes

-   a first side surface, and-   a second side surface located on a side opposite to the first side    surface, and-   in the second partition wall layer,-   a thickness of a portion that covers the first side surface and a    thickness of a portion that covers the second side surface are    different from each other.

(8) The imaging device according to any one of the above (1) to (7),wherein a width of the one color filter and a width of another colorfilter are different from each other.

(9) The imaging device according to any one of the above (1) to (8),wherein the semiconductor substrate further includes an elementseparation layer that separates one photoelectric conversion elementfrom another photoelectric conversion element, which are adjacent toeach other among the plurality of photoelectric conversion elements,

-   the partition wall is located on the element separation layer, and-   an amount of shift of the partition wall toward a central region of    an imaging region including the plurality of photoelectric    conversion elements with respect to the element separation layer    increases toward a side further separated from the central region.

(10) The imaging device according to any one of the above (1) to (8),wherein the semiconductor substrate further includes an elementseparation layer that separates one photoelectric conversion elementfrom another photoelectric conversion element, which are adjacent toeach other among the plurality of photoelectric conversion elements,

-   the partition wall is located on the element separation layer, and-   the element separation layer includes-   a second metal layer, and-   an insulating layer that covers a side surface of the second metal    layer.

(11) The imaging device according to the above (10), wherein the firstmetal layer and the second metal layer are integrated with each other.

(12) The imaging device according to the above (10) further including ametal light-shielding film disposed between the first metal layer andthe second metal layer,

-   wherein the second metal layer and the metal light-shielding film    are integrated with each other.

(13) The imaging device according to any one of the above (1) to (12),wherein the second partition wall layer is configured of a siliconcarbide film having an amorphous crystal structure, and

-   the first partition wall layer is configured of a silicon oxide    film.

(14) An electronic device including:

-   an optical component;-   an imaging device on which light transmitted through the optical    component is incident; and-   a signal processing circuit configured to process a signal output    from the imaging device,-   wherein the imaging device includes:-   a semiconductor substrate including a plurality of photoelectric    conversion elements;-   a plurality of color filters that are provided on the semiconductor    substrate and face each of the plurality of photoelectric conversion    elements; and-   a partition wall that is provided on the semiconductor substrate and    provides separation between one color filter and another color    filter adjacent to each other among the plurality of color filters,-   the partition wall includes-   a first metal layer,-   a first translucent partition wall layer that covers a side surface    of the first metal layer, and-   a second translucent partition wall layer located between the first    metal layer and the first partition wall layer, and-   a refractive index of the second partition wall layer is larger than    a refractive index of the first partition wall layer.

REFERENCE SIGNS LIST

-   2 Partition wall-   11, 31 Insulating film-   20 First metal layer-   20′, 50′ Metal layer-   20 a First side surface-   20 b Second side surface-   20 c Upper end surface-   21 First partition wall layer-   21′, 22′, 51′, 52′ Insulating layer-   22 Second partition wall layer-   30 Metal light-shielding film-   30′ Metal film-   50 Second metal layer-   51 First insulating layer-   52 Second insulating layer-   100, 100A, 1008, 100C, 100D, 100E, 100F, 100G, 100H Imaging device-   102 Pixel-   103 Pixel region-   104 Vertical drive circuit-   105 Column signal processing circuit-   106 Horizontal drive circuit-   107 Output circuit-   108 Control circuit-   109 Vertical signal line-   110 Horizontal signal line-   111 Semiconductor substrate-   201 Solid-state imaging device-   210 Optical lens-   211 Shutter device-   212 Drive circuit-   213 Signal processing circuit-   300 Electronic device-   10402 Imaging unit-   11000 Endoscopic operation system-   11100 Endoscope-   11101 Lens barrel-   11102 Camera head-   11110 Surgical instrument-   11111 Pneumoperitoneum tube-   11112 Energized treatment tool-   11120 Support arm device-   11131 Operator (doctor)-   11131 Operator-   11132 Patient-   11133 Patient bed-   11200 Cart-   11201 Camera control unit-   11202 Display device-   11203 Light source device-   11204 Input device-   11205 Treatment tool control device-   11206 Pneumoperitoneum device-   11207 Recorder-   11208 Printer-   11400 Transmission cable-   11401 Lens unit-   11402 Imaging unit-   11403 Driving unit-   11404 Communication unit-   11405 Camera head control unit-   11411 Communication unit-   11412 Image processing unit-   11413 Control unit-   12000 Vehicle control system-   12001 Communication network-   12010 Drive system control unit-   12020 Body system control unit-   12030 Vehicle external information detection unit-   12031 Imaging unit-   12040 Vehicle internal information detection unit-   12041 Driver state detection unit-   12050 Integrated control unit-   12051 Microcomputer-   12052 Sound image output unit-   12061 Audio speaker-   12062 Display unit-   12063 Instrument panel-   12100 Vehicle-   12101 to 12105 Imaging unit-   12111 to 12114 Imaging range-   AMP Amplifying transistor-   AR1 Central region-   AR2 Peripheral region-   C20 Central position-   CCU11201 Imaging unit-   CF, CF1, CF2, CF3, CF4 Color filter-   CRP5 Central position-   FD Floating diffusion-   H Trench-   I In-vehicle network-   ICG Indocyanine green-   L1, L2, L3, L4, L11, L12, L13 Light-   L21 Light-   ML Micro lens-   MLE End portion-   n21, n22, ncf Refractive index-   PD, PD1, PD2, PD3, PD4 Photodiode-   PU Pixel unit-   QE Quantum efficiency-   RP1, RP2, RP3, RP4, RP5, RP6, RP7, RP8, RP9, RP10, RP11 Resist    pattern-   RST Reset transistor-   SEL Selection transistor-   Si02 Silicon oxide film-   TR Transfer transistor-   VDD Power line-   W20, W30, WCFB, WCFE, WCFG, WCFR, WRP5 Width-   Wgap Distance (shift amount)-   θ1, θ2, θ3 Incidence angle

1. A light detecting device, comprising: a semiconductor substratecomprising: a first surface configured to receive light; and a secondsurface opposite to the first surface; a first photoelectric conversionregion in the semiconductor substrate; a second photoelectric conversionregion in the semiconductor substrate and adjacent to the firstphotoelectric conversion region; a first color filter above the firstphotoelectric conversion region in a cross-sectional view; a secondcolor filter above the second photoelectric conversion region in thecross-sectional view; and a separation region between the first colorfilter and the second color filter in the cross-sectional view, whereinthe separation region includes a first film, a second film, and a firstmetal film, the first film is between the first color filter and thesecond film in the cross-sectional view, the second film is between thefirst film and the first metal film in the cross-sectional view, arefractive index of the first film is less than a refractive index ofthe first color filter, and the refractive index of the first film isless than a refractive index of the second film.
 2. The light detectingdevice according to claim 1, wherein the separation region furtherincludes a third film, and the third film includes silicon oxide.
 3. Thelight detecting device according to claim 2, further comprising a secondmetal film, wherein the second metal film includes a metal, the secondmetal film is covered by the third film, and the third film is betweenthe second film and the second metal film in the cross-sectional view.4. The light detecting device according to claim 1, wherein the firstfilm includes silicon.
 5. The light detecting device according to claim1, wherein the first film includes oxide.
 6. The light detecting deviceaccording to claim 1, wherein the second film includes silicon carbideand has an amorphous crystal structure.
 7. The light detecting deviceaccording to claim 1, wherein the second film is below the first film inthe cross-sectional view.
 8. The light detecting device according toclaim 1, further comprising a lens on a side opposite to thesemiconductor substrate, wherein an end surface of the first metal filmis on a side of the lens, and the second film covers the end surface ofthe first metal film.
 9. The light detecting device according to claim1, wherein the first metal film includes a first side surface and asecond side surface on a side opposite to the first side surface, afirst portion of the second film covers the first side surface of thefirst metal film, a second portion of the second film covers the secondside surface of the first metal film, and a thickness of the firstportion is different from a thickness of the second portion.
 10. Thelight detecting device according to claim 1, wherein a width of thefirst color filter is different from a width of the second color filter.11. The light detecting device according to claim 1, wherein thesemiconductor substrate further includes an element separation layerthat separates the first photoelectric conversion region from the secondphotoelectric conversion region which is adjacent to the firstphotoelectric conversion region, the separation region is on the elementseparation layer, and the element separation layer includes a thirdmetal film, and an insulating film that covers a side surface of thethird metal film.
 12. The light detecting device according to claim 11,wherein the first metal film is integrated with the third metal film.